Investigation of Thermal Atomic Layer Deposited TaAlC with Low Effective Work-Function on HfO2Dielectric Using TaCl5and TEA as Precursors
2016 ◽
Vol 6
(1)
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pp. P38-P41
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2012 ◽
Vol 30
(1)
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pp. 01A162
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2014 ◽
Vol 12
(1-2)
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pp. 238-241
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2007 ◽
Vol 28
(12)
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pp. 1089-1091
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Keyword(s):
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