Analysis of electron mobility in HfO2/TiN gate metal-oxide-semiconductor field effect transistors: The influence of HfO2 thickness, temperature, and oxide charge

2009 ◽  
Vol 105 (2) ◽  
pp. 024510 ◽  
Author(s):  
M. A. Negara ◽  
K. Cherkaoui ◽  
P. K. Hurley ◽  
C. D. Young ◽  
P. Majhi ◽  
...  
2011 ◽  
Vol 4 (6) ◽  
pp. 064201 ◽  
Author(s):  
Tomonori Nishimura ◽  
Choong Hyun Lee ◽  
Toshiyuki Tabata ◽  
Sheng Kai Wang ◽  
Kosuke Nagashio ◽  
...  

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