mobility degradation
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2021 ◽  
Vol 118 (3) ◽  
pp. 031601
Author(s):  
Zhaofu Zhang ◽  
Zhen Wang ◽  
Yuzheng Guo ◽  
John Robertson

Author(s):  
Simon Schlipf ◽  
André Clausner ◽  
Jens Paul ◽  
Simone Capecchi ◽  
Laura Wambera ◽  
...  
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2020 ◽  
Vol 15 (2) ◽  
pp. 1-5
Author(s):  
Luciano Mendes Camillo ◽  
Marcos Paulo Braga de Lima ◽  
Marco Aurélio Pinhel Peixoto ◽  
Marcello Marcelino Correa ◽  
Salvador Pinillos Gimenez

The zero temperature coefficient (ZTC) is investigated by three-dimensional numerical simulations in the Metal-Oxide-Semiconductor (MOS) Field Effect Transistor (MOSFET) with the ellipsoidal (EM) and conventional rectangular gate geometries (CM), considering the same channel widths (W), gate areas (Ag) and bias condition (BC).   In this work an improved simple model which predicts the ZTC point taking into account only the mobility degradation factor (c) and threshold voltage (Vth) parameters as function of temperature is proposed in the linear and saturation operation regions. The analysis takes into account the temperature variations of the threshold voltage and the mobility degradation factor. Although simple, the model predictions present a good agreement with the numerical simulations results.


2020 ◽  
Vol 1 (1) ◽  
pp. 26-31
Author(s):  
Noureddine Maouhoub ◽  
Khalid Rais

Series resistance and mobility attenuation parameter are parasitic phenomena that limit the scaling of advanced MOSFETs. In this work, an iterative method is proposed to extract the series resistance and mobility degradation parameter in short channel MOSFETs. It also allows us to extract the surface roughness amplitude. The principle of this method is based on the exponential model of effective mobility and the least squares methods. From these, two analytical equations are obtained to determine the series resistance and the low field mobility as function of the mobility degradation. The mobility attenuation parameter is extracted using an iterative procedure to minimize the root means squared error (RMSE) value. The results obtained by this technique for a single short channel device have shown the good agreement with measurements data at strong inversion. 


Author(s):  
Noureddine Maouhoub ◽  
Khalid Rais

Series resistance and mobility attenuation parameter are parasitic phenomena that limit the scaling of advanced MOSFETs. In this work, an iterative method is proposed to extract the series resistance and mobility degradation parameter in short channel MOSFETs. It also allows us to extract the surface roughness amplitude. The principle of this method is based on the exponential model of effective mobility and the least squares methods. From these, two analytical equations are obtained to determine the series resistance and the low field mobility as function of the mobility degradation. The mobility attenuation parameter is extracted using an iterative procedure to minimize the root means squared error (RMSE) value. The results obtained by this technique for a single short channel device have shown the good agreement with measurements data at strong inversion.  


2019 ◽  
Vol 2 (1) ◽  
pp. 329-338 ◽  
Author(s):  
Rosa María Luna-Sánchez ◽  
Ignacio González-Martínez

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