Circuit‐theoretic treatment for anisotropic elastic waveguides and its application to the design of nonreciprocal thin‐film acoustic devices using magnetoelastic material YIG

ABSTRACTIn this paper, we present a preliminary study of texture development during copper thin film deposition. Using direct current (DC) magnetron sputtering technique, we deposit copper films on a SiO2/Si(111) substrate. A thin layer of copper of <111> texture first develops, and another thin layer of <110> ensues. As deposition continues, a third layer of copper of <111> texture forms on the top, leading to a copper thin film of alternating <111> and <110> textures. The multiple layers of copper thin films of alternating textures form during continuous deposition without changing deposition conditions. The film morphology is characterized with scanning electron microscopy (SEM) and atomic force microscopy (AFM), and the texture with X-ray diffraction (XRD). Based on anisotropic elastic analyses and molecular dynamics simulations, we propose a model of texture evolution during the formation of multilayers, attributing the texture evolution to the competition of surface and strain energies.

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Normal‐mode analysis for anisotropic elastic waveguides and its application to a Rayleigh‐Love wave mode converter

Journal of Applied Physics ◽

10.1063/1.324497 ◽

1978 ◽

Vol 49 (11) ◽

pp. 5407-5415 ◽

Cited By ~ 3

Author(s):

M. Sugimoto ◽

T. Makimoto

Keyword(s):

Normal Mode ◽

Love Wave ◽

Normal Mode Analysis ◽

Wave Mode ◽

Mode Converter ◽

Mode Analysis ◽

Anisotropic Elastic ◽

Elastic Waveguides

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Advanced Resonant-Ultrasound Spectroscopy for Studying Anisotropic Elastic Constants of Thin Films

MRS Proceedings ◽

10.1557/proc-875-o1.1 ◽

2005 ◽

Vol 875 ◽

Cited By ~ 1

Author(s):

Hirotsugu Ogi ◽

Nobutomo Nakamura ◽

Hiroshi Tanei ◽

Masahiko Hirao

Keyword(s):

Thin Film ◽

Thin Films ◽

Film Thickness ◽

Elastic Constants ◽

Elastic Anisotropy ◽

Thickness Direction ◽

Resonant Ultrasound Spectroscopy ◽

Out Of Plane ◽

Resonant Ultrasound ◽

Anisotropic Elastic

AbstractThis paper presents two advanced acoustic methods for the determination of anisotropic elastic constants of deposited thin films. They are resonant-ultrasound spectroscopy with laser-Doppler interferometry (RUS/Laser method) and picosecond-laser ultrasound method. Deposited thin films usually exhibit elastic anisotropy between the film-growth direction and an in-plane direction, and they show five independent elastic constants denoted by C11,C33,C44,C66 and C13 when the x3 axis is set along the film-thickness direction. The former method determines four moduli except C44, the out-of-plane shear modulus, through free-vibration resonance frequencies of the film/substrate specimen. This method is applicable to thin films thicker than about 200 nm. The latter determines C33, the out-of-plane modulus, accurately bymeasuring the round-trip time of the longitudinal wave traveling along the film-thickness direction. This method is applicable to thin films thicker than about 20 nm. Thus, combination of these two methods allows us to discuss the elastic anisotropy of thin films. The results for Co/Pt superlattice thin film and copper thin film are presented.

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