Theoretical study of the ultimate resolution in electron beam lithography by Monte Carlo simulation, including secondary electron generation: Energy dissipation profile in polymethylmethacrylate

1983 ◽  
Vol 54 (7) ◽  
pp. 3855-3859 ◽  
Author(s):  
Norihiko Samoto ◽  
Ryuichi Shimizu
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Energy Dissipation ◽  
Electron Beam Lithography ◽  
Secondary Electron ◽  
Theoretical Study ◽  
Electron Generation ◽  
Secondary Electron Generation

Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Energy Distribution ◽  
Electron Energy ◽  
Electron Beam Lithography ◽  
Energy Deposition ◽  
Si Substrate ◽  
Positive Resist

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.

Sign in / Sign up

Export Citation Format

Share Document