Behavior of downstream plasmas generated in a microwave plasma chemical‐vapor deposition reactor

Journal of Applied Physics ◽

10.1063/1.342467 ◽

1988 ◽

Vol 64 (9) ◽

pp. 4398-4403 ◽

Author(s):

P. K. Shufflebotham ◽

D. J. Thomson ◽

H. C. Card

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Development of cylinderical cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition

2013 Abstracts IEEE International Conference on Plasma Science (ICOPS) ◽

10.1109/plasma.2013.6635167 ◽

2013 ◽

Author(s):

J. Su ◽

Y. Li ◽

Y. Liu ◽

M Ding ◽

W. Tang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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A 915 MHz/75 kW cylindrical cavity type microwave plasma chemical vapor deposition reactor with a ladder-shaped circumferential antenna developed for growing large area diamond films

Diamond and Related Materials ◽

10.1016/j.diamond.2017.08.007 ◽

2017 ◽

Vol 78 ◽

pp. 67-72 ◽

Author(s):

Y.F. Li ◽

X.M. An ◽

X.C. Liu ◽

L. Jiang ◽

P.W. Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cylindrical Cavity ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Numerical analysis of a mixture of Ar/NH3 microwave plasma chemical vapor deposition reactor

Journal of Applied Physics ◽

10.1063/1.4728210 ◽

2012 ◽

Vol 111 (11) ◽

pp. 113304 ◽

Author(s):

Zhi Li ◽

Zhen Zhao ◽

Xuehui Li

Keyword(s):

Chemical Vapor Deposition ◽

Numerical Analysis ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Silicon carbon nitride cones prepared from an ellipsoid microwave plasma chemical vapor deposition reactor

Materials Letters ◽

10.1016/j.matlet.2004.06.050 ◽

2004 ◽

Vol 58 (27-28) ◽

pp. 3467-3469 ◽

Author(s):

W.J. Cheng ◽

J.C. Jiang ◽

Y. Zhang ◽

H.S. Zhu ◽

D.Z. Shen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition ◽

Silicon Carbon ◽

Silicon Carbon Nitride

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Numerical analyses of a microwave plasma chemical vapor deposition reactor for thick diamond syntheses

Diamond and Related Materials ◽

10.1016/j.diamond.2005.10.009 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1389-1394 ◽

Author(s):

H. Yamada ◽

A. Chayahara ◽

Y. Mokuno ◽

Y. Horino ◽

S. Shikata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Numerical Analyses ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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A dome-shaped cavity type microwave plasma chemical vapor deposition reactor for diamond films deposition

Vacuum ◽

10.1016/j.vacuum.2014.04.002 ◽

2014 ◽

Vol 107 ◽

pp. 51-55 ◽

Author(s):

J.J. Su ◽

Y.F. Li ◽

M.H. Ding ◽

X.L. Li ◽

Y.Q. Liu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Analysis of hydrogen plasma in a microwave plasma chemical vapor deposition reactor

Journal of Applied Physics ◽

10.1063/1.4943025 ◽

2016 ◽

Vol 119 (11) ◽

pp. 113301 ◽

Author(s):

G. Shivkumar ◽

S. S. Tholeti ◽

M. A. Alrefae ◽

T. S. Fisher ◽

A. A. Alexeenko

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Hydrogen Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Self-Organized Microcones Grown on Si Substrate by Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.3050 ◽

2008 ◽

Vol 47 (4) ◽

pp. 3050-3052

Author(s):

Masataka Moriya ◽

Yuji Matsumoto ◽

Yoshinao Mizugaki ◽

Tadayuki Kobayashi ◽

Kouichi Usami

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Si Substrate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Chinese Physics ◽

10.1088/1009-1963/9/7/015 ◽

2000 ◽

Vol 9 (7) ◽

pp. 545-549

Author(s):

Zhang Yong-ping ◽

Gu You-song ◽

Chang Xiang-rong ◽

Tian Zhong-zhuo ◽

Shi Dong-xia ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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