Numerical analysis of a mixture of Ar/NH3 microwave plasma chemical vapor deposition reactor

2012 ◽  
Vol 111 (11) ◽  
pp. 113304 ◽  
Author(s):  
Zhi Li ◽  
Zhen Zhao ◽  
Xuehui Li
Keyword(s):  
Chemical Vapor Deposition ◽  
Numerical Analysis ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Chemical Vapor Deposition Reactor ◽  
Plasma Chemical Vapor Deposition

Analysis of hydrogen plasma in a microwave plasma chemical vapor deposition reactor

2016 ◽  
Vol 119 (11) ◽  
pp. 113301 ◽  
Author(s):  
G. Shivkumar ◽  
S. S. Tholeti ◽  
M. A. Alrefae ◽  
T. S. Fisher ◽  
A. A. Alexeenko
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Chemical Vapor Deposition Reactor ◽  
Plasma Chemical Vapor Deposition

Self-Organized Microcones Grown on Si Substrate by Microwave Plasma Chemical Vapor Deposition

2008 ◽  
Vol 47 (4) ◽  
pp. 3050-3052
Author(s):  
Masataka Moriya ◽  
Yuji Matsumoto ◽  
Yoshinao Mizugaki ◽  
Tadayuki Kobayashi ◽  
Kouichi Usami
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Si Substrate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Self Organized

Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

2000 ◽  
Vol 9 (7) ◽  
pp. 545-549
Author(s):  
Zhang Yong-ping ◽  
Gu You-song ◽  
Chang Xiang-rong ◽  
Tian Zhong-zhuo ◽  
Shi Dong-xia ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Nitride ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition
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