Erratum: ‘‘Thermal conductivity of heavily doped low‐pressure chemical vapor deposited polycrystalline silicon films’’ [J. Appl. Phys. 63, 1442 (1988)]
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1986 ◽
Vol 15
(5)
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pp. 279-285
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1983 ◽
Vol 9
(1-3)
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pp. 235-245
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