Current‐voltage characteristics ofn‐amorphous low‐pressure chemical vapor deposited silicon films onp‐crystalline silicon

1989 ◽  
Vol 66 (12) ◽  
pp. 5894-5900 ◽  
Author(s):  
N. Du ◽  
S. Salkalachen ◽  
J. Yao ◽  
H. R. Froelich ◽  
P. K. John ◽  
...  
Keyword(s):  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Current Voltage ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical ◽  
Current Voltage Characteristics

Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films

1987 ◽  
Vol 62 (9) ◽  
pp. 3740-3746 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Nobutake Konishi ◽  
Kenji Miyata ◽  
Norimasa Kamezawa
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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