Atomic force microscopy for the determination of refractive index profiles of optical fibers and waveguides: A quantitative study

1997 ◽  
Vol 82 (6) ◽  
pp. 2730-2734 ◽  
Author(s):  
S. T. Huntington ◽  
P. Mulvaney ◽  
A. Roberts ◽  
K. A. Nugent ◽  
M. Bazylenko
Keyword(s):  
Atomic Force Microscopy ◽  
Refractive Index ◽  
Optical Fibers ◽  
Quantitative Study ◽  
Force Microscopy ◽  
Atomic Force

scholarly journals Refractive index profiles of Ge-doped optical fibers with nanometer spatial resolution using atomic force microscopy

2004 ◽  
Vol 12 (7) ◽  
pp. 1452 ◽  
Author(s):  
P. Pace ◽  
Shane T. Huntington ◽  
K. Lyytik�inen ◽  
A. Roberts ◽  
J. D. Love
Keyword(s):  
Atomic Force Microscopy ◽  
Refractive Index ◽  
Spatial Resolution ◽  
Optical Fibers ◽  
Force Microscopy ◽  
Atomic Force

scholarly journals Топография поверхности и оптические характеристики тонких пленок AlN на подложке GaAs (100), полученных методом реактивного ионно-плазменного распыления

2019 ◽  
Vol 45 (5) ◽  
pp. 38
Author(s):  
Е.В. Фомин ◽  
А.Д. Бондарев ◽  
A.I. Rumyantseva ◽  
T. Maurer ◽  
Н.А. Пихтин ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Refractive Index ◽  
Surface Structure ◽  
Optical Characteristics ◽  
Process Conditions ◽  
Antireflection Coatings ◽  
Force Microscopy ◽  
Plasma Sputtering ◽  
Atomic Force ◽  
Ion Plasma

AbstractA study of the surface topography and optical characteristics of thin AlN films used as passivating and antireflection coatings deposited on n -GaAs (100) substrates by reactive ion-plasma sputtering is reported. It was found that the process conditions affect the structure and the optical characteristics of the films, which makes it possible to obtain coatings with prescribed parameters. An analysis of the results furnished by ellipsometry and atomic-force microscopy of the surface shows that the refractive index of the films is correlated with the surface structure.

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