Characterization of pulse-modulated inductively coupled plasmas in argon and chlorine

1997 ◽  
Vol 82 (6) ◽  
pp. 2814-2821 ◽  
Author(s):  
G. A. Hebner ◽  
C. B. Fleddermann
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

Optical Characterization of RF Inductively Coupled Plasmas

2006 ◽  
pp. 489-502 ◽  
Author(s):  
A. E. Wendt ◽  
D. F. Beale ◽  
W. N. G. Hitchon ◽  
E. Keiter ◽  
V. Kolobov ◽  
...  
Keyword(s):  
Optical Characterization ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

Characterization of Low-k SiCOH Film Etching in Fluorocarbon Inductively Coupled Plasmas

2017 ◽  
Vol 9 (2) ◽  
pp. 174-178
Author(s):  
Haegyu Jang ◽  
Hoonbae Kim ◽  
Sungwoo Lee ◽  
Hyeonseok Moon ◽  
Donggeun Jung ◽  
...  
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas ◽  
Low K

scholarly journals Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]

2020 ◽  
Vol 128 (8) ◽  
pp. 089901
Author(s):  
Chenhui Qu ◽  
Steven J. Lanham ◽  
Steven C. Shannon ◽  
Sang Ki Nam ◽  
Mark J. Kushner
Keyword(s):  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Power Matching ◽  
Coupled Plasmas

Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

2006 ◽  
Vol 83 (2) ◽  
pp. 328-335 ◽  
Author(s):  
S.W. Na ◽  
M.H. Shin ◽  
Y.M. Chung ◽  
J.G. Han ◽  
S.H. Jeung ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas
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