Properties of amorphous silicon films and devices deposited using reactive plasma beam deposition

1992 ◽  
Author(s):  
Vikram Dalal ◽  
R. D. Knox ◽  
N. Kandalaft ◽  
K. Han ◽  
B. Moradi
Keyword(s):  
Amorphous Silicon ◽  
Silicon Films ◽  
Plasma Beam ◽  
Reactive Plasma ◽  
Beam Deposition

Preparation of doped amorphous silicon films by ionized‐cluster beam deposition

1983 ◽  
Vol 54 (3) ◽  
pp. 1583-1587 ◽  
Author(s):  
I. Yamada ◽  
I. Nagai ◽  
M. Horie ◽  
T. Takagi
Keyword(s):  
Amorphous Silicon ◽  
Silicon Films ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Structural analysis of ZrN and TiN films prepared by reactive plasma beam deposition

1993 ◽  
Vol 228 (1-2) ◽  
pp. 233-237 ◽  
Author(s):  
P. Panjan ◽  
B. Navinšek ◽  
A. Žabkar ◽  
V. Marinković ◽  
Dj. Mandrino ◽  
...  
Keyword(s):  
Structural Analysis ◽  
Plasma Beam ◽  
Reactive Plasma ◽  
Beam Deposition

HYDROGEN PROFILING IN GAS PHASE DOPED AND ION IMPLANTED AMORPHOUS SILICON FILMS

1981 ◽  
Vol 42 (C4) ◽  
pp. C4-779-C4-782 ◽  
Author(s):  
F. J. Demond ◽  
G. Müller ◽  
H. Damjantschitsch ◽  
H. Mannsperger ◽  
S. Kalbitzer ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Gas Phase ◽  
Silicon Films ◽  
Ion Implanted
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