Low temperature fabrication and characterization of nickel germanide Schottky source/drain contacts for implant-less germanium p-channel metal-oxide-semiconductor field-effect transistors

2012 ◽  
Vol 100 (19) ◽  
pp. 192101 ◽  
Author(s):  
D. R. Gajula ◽  
D. W. McNeill ◽  
B. E. Coss ◽  
H. Dong ◽  
S. Jandhyala ◽  
...  
Keyword(s):  
Low Temperature ◽  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Fabrication And Characterization

Fabrication and characterization of compact 100nm scale metal oxide semiconductor field effect transistors

1993 ◽  
Vol 21 (1-4) ◽  
pp. 409-417
Author(s):  
C.M. Reeves ◽  
S.J. Wind ◽  
F.J. Hohn ◽  
J.J. Bucchignano ◽  
Y.T. Lii ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Fabrication And Characterization

Fabrication and characterization of vertical-type, self-aligned asymmetric double-gate metal-oxide-semiconductor field-effect-transistors

2005 ◽  
Vol 86 (12) ◽  
pp. 123512 ◽  
Author(s):  
Meishoku Masahara ◽  
Yongxun Liu ◽  
Kenichi Ishii ◽  
Kunihiro Sakamoto ◽  
Takashi Matsukawa ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Double Gate ◽  
Fabrication And Characterization

High-temperature modeling and characterization of 6H silicon carbide metal-oxide-semiconductor field-effect transistors

2005 ◽  
Vol 97 (4) ◽  
pp. 046106 ◽  
Author(s):  
Stephen K. Powell ◽  
Neil Goldsman ◽  
Aivars Lelis ◽  
James M. McGarrity ◽  
Flynn B. McLean
Keyword(s):  
Silicon Carbide ◽  
High Temperature ◽  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Temperature Modeling
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