Effects of SF6 plasma treatment on electrical characteristics of TaN-Al2O3-InP metal-oxide-semiconductor field-effect transistor
2007 ◽
Vol 46
(6A)
◽
pp. 3324-3329
◽
2008 ◽
Vol 47
(2)
◽
pp. 824-832
◽
2000 ◽
Vol 18
(1)
◽
pp. 533
◽
2021 ◽
Vol 134
◽
pp. 106046
Keyword(s):
2020 ◽
Vol 21
(3)
◽
pp. 339-347
◽
1997 ◽
Vol 9
(8)
◽
pp. 1143-1145
◽