Strain-domain structure and stability diagrams for single-domain magnetic thin films

2013 ◽  
Vol 103 (14) ◽  
pp. 142413 ◽  
Author(s):  
J. J. Wang ◽  
Jia-Mian Hu ◽  
Long-Qing Chen ◽  
Ce-Wen Nan
Keyword(s):  
Thin Films ◽  
Domain Structure ◽  
Magnetic Thin Films ◽  
Single Domain ◽  
Structure And Stability ◽  
Stability Diagrams

Hysteresis in a Microactuator With Single-Domain Magnetic Thin Films

2010 ◽  
Vol 46 (2) ◽  
pp. 630-633 ◽  
Author(s):  
Zung-Hang Wei ◽  
Chi-Kuen Lo ◽  
Da-Ren Liu ◽  
Yi-Ping Hsieh ◽  
Yun-Ruei Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Thin Films ◽  
Single Domain

Micromagnetic Simulations Of Domain Structures In Thin Films And Bulk Hard Magnets

1999 ◽  
Vol 5 (S2) ◽  
pp. 36-37
Author(s):  
Zhi-Xiong Cai ◽  
Yimei Zhu
Keyword(s):  
Thin Films ◽  
Magnetic Materials ◽  
Domain Structure ◽  
Easy Axis ◽  
Magnetic Thin Films ◽  
Magnetic Films ◽  
Electron Holography ◽  
Bulk Materials ◽  
Hard Magnetic Materials ◽  
Domain Structures

The shape anisotropy of a magnetic thin film competes with the easy-axis anisotropy, which gives rise to different domain structures compared to the bulk magnetic materials. Recent Lorentz microscope and electron holography and differential-phase-contrast experiments show complex domain structures with features not found in bulk materials seen by magneto-optic method.In this report we use micromagnetic simulation techniques to study the effect of thickness on the domain structure of magnetic thin films with various orientations relative to the easy axis and compare with those in the bulk materials. The results of the simulations can be used to compare with the data obtained using electron holography experiments to give us quantitative understanding of the domain structure in hard magnetic materials.We model the magnetic films with an array of dipoles of size 16×l6×Lz, where Lz the thickness of the sample.

Reactive RF magnetron sputtering epitaxy of NiO thin films on (0001) sapphire and (100) MgO substrates

2021 ◽  
Author(s):  
Keisuke Nishimoto ◽  
Kohei Shima ◽  
Shigefusa F. Chichibu ◽  
Mutsumi Sugiyama
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Domain Structure ◽  
Sapphire Substrate ◽  
Rf Magnetron Sputtering ◽  
Optical Devices ◽  
Single Domain ◽  
Grain Structures ◽  
Reactive Rf Magnetron Sputtering ◽  
Mgo Substrate

Abstract Epitaxial growths of NiO thin films were realized on (0001) sapphire and (100) MgO substrates by using a reactive RF magnetron sputtering method. The NiO epilayers grown on a (0001) sapphire exhibited the (111)-oriented double-domain structure, which comprised of a triangular and its inverted triangular grains. Meanwhile, the NiO epilayers on a (100) MgO exhibited the (100)-oriented single-domain structure, which comprised of quadrangular grains. The observed grain structures most likely reflect the growth planes of respective NiO epilayers, and, mixed crystals of NiO and MgO were present near the interface. Therefore, A (100) MgO substrate is suitable for obtaining a single-domain NiO epilayer, whereas a (0001) sapphire substrate is suitable for obtaining a NiO epilayer without interdiffusion between NiO and sapphire. These NiO epilayers will be expected for applying the physical properties evaluation using photoluminescence or Hall measurements, and the fabrication of electrical or optical devices.

Morphology and Domain Structure of Unsupported PbTiO3Thin Films Prepared by Sol-Gel Process

1995 ◽  
Vol 403 ◽  
Author(s):  
C. J. Lu ◽  
S. B. Ren ◽  
H. M. Shen ◽  
Y. N. Wang
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Domain Structure ◽  
Domain Walls ◽  
Sol Gel ◽  
Single Domain ◽  
Annealing Temperatures ◽  
Sol Gel Process ◽  
Size And Morphology ◽  
Almost All

AbstractThe morphology and domain structure of unsupported PbTiO3thin films with fine grains (>200 nm) were investigated by TEM technique. The unsupported PbTiO3thin films were successfully prepared by sol-gel process onto NaCI substrates and followed by dissolving away the substrates. Electron diffiraction patterns showed that the unsupported PbTiO3thin films had slight <110> preferred orientation perpendicular to the film surfaces. Grain size and morphology vary significantly with the thickness of the films or the annealing temperatures. Even though the grain size is rather small (40–180 nm), the domains are clearly visible. Most of the grains show single domain, while some irregular and curved domain walls appear only in a small portion of the fine grains. The number of single-domained grains increases with decreasing grain size. Almost all domain walls observed are 90° walls.

Domain structure and stability of MOCVD-derived ferroelectric thin films

1999 ◽  
Vol 221 (1) ◽  
pp. 237-244 ◽  
Author(s):  
C. H. Lin ◽  
B. M. Yen ◽  
R. S. Batzer ◽  
Haydn Chen
Keyword(s):  
Thin Films ◽  
Domain Structure ◽  
Ferroelectric Thin Films ◽  
Structure And Stability

Transmission Electron Microscopy studies of texture of Cr underlayer of magnetic recording hard disk

1991 ◽  
Vol 49 ◽  
pp. 580-581
Author(s):  
L. Tang ◽  
G. Thomas ◽  
M. R. Khan ◽  
S. L. Duan
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Magnetic Recording ◽  
Magnetic Thin Films ◽  
Magnetic Films ◽  
Substrate Bias ◽  
Epitaxial Relationship ◽  
Transmission Electron

Cr thin films are often used as underlayers for Co alloy magnetic thin films, such as Co1, CoNi2, and CoNiCr3, for high density longitudinal magnetic recording. It is belived that the role of the Cr underlayer is to control the growth and texture of the Co alloy magnetic thin films, and, then, to increase the in plane coercivity of the films. Although many epitaxial relationship between the Cr underlayer and the magnetic films, such as ﹛1010﹜Co/ {110﹜Cr4, ﹛2110﹜Co/ ﹛001﹜Cr5, ﹛0002﹜Co/﹛110﹜Cr6, have been suggested and appear to be related to the Cr thickness, the texture of the Cr underlayer itself is still not understood very well. In this study, the texture of a 2000 Å thick Cr underlayer on Nip/Al substrate for thin films of (Co75Ni25)1-xTix dc-sputtered with - 200 V substrate bias is investigated by electron microscopy.

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