scholarly journals Atomic layer deposition of ZrO2as gate dielectrics for AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors on silicon

2013 ◽  
Vol 103 (14) ◽  
pp. 142109 ◽  
Author(s):  
G. Ye ◽  
H. Wang ◽  
S. Arulkumaran ◽  
G. I. Ng ◽  
R. Hofstetter ◽  
...  
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