Enhancement mode AlGaN/GaN MOS high-electron-mobility transistors with ZrO2gate dielectric deposited by atomic layer deposition

2016 ◽  
Vol 9 (7) ◽  
pp. 071003 ◽  
Author(s):  
Travis J. Anderson ◽  
Virginia D. Wheeler ◽  
David I. Shahin ◽  
Marko J. Tadjer ◽  
Andrew D. Koehler ◽  
...  
Sign in / Sign up

Export Citation Format

Share Document