0.1- $\mu \text{m}$ Atomic Layer Deposition Al2O3 Passivated InAlN/GaN High Electron-Mobility Transistors for E-Band Power Amplifiers

2015 ◽  
Vol 36 (5) ◽  
pp. 442-444 ◽  
Author(s):  
Dong Xu ◽  
K. K. Chu ◽  
J. A. Diaz ◽  
M. Ashman ◽  
J. J. Komiak ◽  
...  
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