scholarly journals Effects of roughness and temperature on low-energy hydrogen positive and negative ion reflection from silicon and carbon surfaces

2014 ◽  
Vol 85 (2) ◽  
pp. 02C311 ◽  
Author(s):  
N. Tanaka ◽  
S. Kato ◽  
T. Miyamoto ◽  
M. Nishiura ◽  
K. Tsumori ◽  
...  
1996 ◽  
Vol 438 ◽  
Author(s):  
N. Tsubouchi ◽  
Y. Horino ◽  
B. Enders ◽  
A. Chayahara ◽  
A. Kinomura ◽  
...  

AbstractUsing a newly developed ion beam apparatus, PANDA (Positive And Negative ions Deposition Apparatus), carbon nitride films were prepared by simultaneous deposition of mass-analyzed low energy positive and negative ions such as C2-, N+, under ultra high vacuum conditions, in the order of 10−6 Pa on silicon wafer. The ion energy was varied from 50 to 400 eV. The film properties as a function of their beam energy were evaluated by Rutherford Backscattering Spectrometry (RBS), Fourier Transform Infrared spectroscopy (FTIR) and Raman scattering. From the results, it is suggested that the C-N triple bond contents in films depends on nitrogen ion energy.


1995 ◽  
Vol 341 (1-2) ◽  
pp. 19-28 ◽  
Author(s):  
Q.B. Lu ◽  
D.J. O'Connor ◽  
B.V. King ◽  
Y.G. Shen ◽  
R.J. MacDonald

1995 ◽  
Vol 324 (1) ◽  
pp. L349-L354 ◽  
Author(s):  
R. Souda ◽  
K. Yamamoto ◽  
W. Hayami ◽  
B. Tilley ◽  
T. Aizawa ◽  
...  

2000 ◽  
Vol 113 (24) ◽  
pp. 11063-11070 ◽  
Author(s):  
Judith Langer ◽  
Sara Matt ◽  
Martina Meinke ◽  
Petra Tegeder ◽  
Aleksandar Stamatovic ◽  
...  

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