scholarly journals Phase formation, thermal stability and magnetic moment of cobalt nitride thin films

AIP Advances ◽  
2015 ◽  
Vol 5 (9) ◽  
pp. 097131 ◽  
Author(s):  
Rachana Gupta ◽  
Nidhi Pandey ◽  
Akhil Tayal ◽  
Mukul Gupta
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Phase Formation ◽  
Magnetic Moment

Influence of carbon deficiency on phase formation and thermal stability of super-hard TaCy thin films

2018 ◽  
Vol 149 ◽  
pp. 150-154 ◽  
Author(s):  
H. Riedl ◽  
T. Glechner ◽  
T. Wojcik ◽  
N. Koutná ◽  
S. Kolozsvári ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Phase Formation ◽  
Thermal Stability Of

scholarly journals Effect of Al doping on phase formation and thermal stability of iron nitride thin films

2015 ◽  
Vol 650 ◽  
pp. 647-653 ◽  
Author(s):  
Akhil Tayal ◽  
Mukul Gupta ◽  
Nidhi Pandey ◽  
Ajay Gupta ◽  
Michael Horisberger ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Phase Formation ◽  
Iron Nitride ◽  
Al Doping ◽  
Thermal Stability Of

A thermodynamic study on phase formation and thermal stability of AlSiTaTiZr high-entropy alloy thin films

2020 ◽  
Vol 838 ◽  
pp. 155580
Author(s):  
Felipe Cemin ◽  
Mawin J.M. Jimenez ◽  
Leonardo M. Leidens ◽  
Carlos A. Figueroa ◽  
Fernando Alvarez
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Phase Formation ◽  
Thermodynamic Study ◽  
High Entropy Alloy ◽  
High Entropy ◽  
Thermal Stability Of

Role of additives (X=Ti, Zr) in phase formation and thermal stability of Fe–X–N thin films

2013 ◽  
Vol 536 ◽  
pp. 39-49 ◽  
Author(s):  
Akhil Tayal ◽  
Mukul Gupta ◽  
Ajay Gupta ◽  
M. Horisberger ◽  
J. Stahn
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Phase Formation ◽  
Thermal Stability Of

Characterization of reactive phase formation in sputter-deposited Ni/Al multilayer thin films using TEM

1996 ◽  
Vol 54 ◽  
pp. 1000-1001
Author(s):  
G. Lucadamo ◽  
K. Barmak ◽  
C. Michaelsen
Keyword(s):  
Thin Films ◽  
Phase Formation ◽  
Dark Field ◽  
Nickel Layer ◽  
Multilayer Thin Films ◽  
Cross Sectional ◽  
Dark Field Imaging ◽  
Transmission Electron ◽  
Sputter Deposited ◽  
Constant Heating

The subject of reactive phase formation in multilayer thin films of varying periodicity has stimulated much research over the past few years. Recent studies have sought to understand the reactions that occur during the annealing of Ni/Al multilayers. Dark field imaging from transmission electron microscopy (TEM) studies in conjunction with in situ x-ray diffraction measurements, and calorimetry experiments (isothermal and constant heating rate), have yielded new insights into the sequence of phases that occur during annealing and the evolution of their microstructure.In this paper we report on reactive phase formation in sputter-deposited lNi:3Al multilayer thin films with a periodicity A (the combined thickness of an aluminum and nickel layer) from 2.5 to 320 nm. A cross-sectional TEM micrograph of an as-deposited film with a periodicity of 10 nm is shown in figure 1. This image shows diffraction contrast from the Ni grains and occasionally from the Al grains in their respective layers.

scholarly journals The role of the substrate on the mechanical and thermal stability of Pd thin films during hydrogen (de)sorption

2021 ◽  
Vol 46 (5) ◽  
pp. 4137-4153
Author(s):  
Neha Verma ◽  
Rob Delhez ◽  
Niek M. van der Pers ◽  
Frans D. Tichelaar ◽  
Amarante J. Böttger
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Thermal Stability Of
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