scholarly journals Set-up of a high-resolution 300 mK atomic force microscope in an ultra-high vacuum compatible 3He/10 T cryostat

2016 ◽  
Vol 87 (7) ◽  
pp. 073702 ◽  
Author(s):  
H. von Allwörden ◽  
K. Ruschmeier ◽  
A. Köhler ◽  
T. Eelbo ◽  
A. Schwarz ◽  
...  
Keyword(s):  
High Resolution ◽  
Atomic Force Microscope ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Atomic Force ◽  
Set Up

scholarly journals Direct-write polymer nanolithography in ultra-high vacuum

2012 ◽  
Vol 3 ◽  
pp. 52-56 ◽  
Author(s):  
Woo-Kyung Lee ◽  
Minchul Yang ◽  
Arnaldo R Laracuente ◽  
William P King ◽  
Lloyd J Whitman ◽  
...  
Keyword(s):  
Atomic Force Microscope ◽  
Silicon Oxide ◽  
High Vacuum ◽  
Polymer Chains ◽  
Ultra High Vacuum ◽  
Direct Write ◽  
Polymer Nanostructures ◽  
Atomic Force

Polymer nanostructures were directly written onto substrates in ultra-high vacuum. The polymer ink was coated onto atomic force microscope (AFM) probes that could be heated to control the ink viscosity. Then, the ink-coated probes were placed into an ultra-high vacuum (UHV) AFM and used to write polymer nanostructures on surfaces, including surfaces cleaned in UHV. Controlling the writing speed of the tip enabled the control over the number of monolayers of the polymer ink deposited on the surface from a single to tens of monolayers, with higher writing speeds generating thinner polymer nanostructures. Deposition onto silicon oxide-terminated substrates led to polymer chains standing upright on the surface, whereas deposition onto vacuum reconstructed silicon yielded polymer chains aligned along the surface.

The Role of Plastic Deformation in Nanometer-Scale Wear

2010 ◽  
Vol 64 ◽  
pp. 25-32 ◽  
Author(s):  
Philip Egberts ◽  
Roland Bennewitz
Keyword(s):  
Plastic Deformation ◽  
Atomic Force Microscope ◽  
Edge Dislocation ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Nanometer Scale ◽  
Single Asperity ◽  
Atomic Force ◽  
Low Load

Scratches on KBr(100) surfaces were produced and examined with an atomic force microscope (AFM) operated in an ultra-high vacuum (UHV) environment. Scratches with lengths on the order of 100s of nanometers and depths on the order of atomic layers were investigated. Non-contact AFM topographic images of scratches revealed screw and edge dislocation activity around the scratch sites, illuminating the role of plastic deformation in wear processes. Friction coefficients of approximately 0.3 were measured during scratching, more comparable to macroscopic friction experiments than those measured in low-load, single asperity experiments.

Ambient-pressure atomic force microscope with variable pressure from ultra-high vacuum up to one bar

2018 ◽  
Vol 89 (10) ◽  
pp. 103701 ◽  
Author(s):  
Joong Il Jake Choi ◽  
Jeong Jin Kim ◽  
Wooseok Oh ◽  
Won Hui Doh ◽  
Jeong Young Park
Keyword(s):  
Atomic Force Microscope ◽  
Ambient Pressure ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Variable Pressure ◽  
Atomic Force

In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope

2010 ◽  
Vol 518 (16) ◽  
pp. 4688-4691 ◽  
Author(s):  
Krzysztof Kolanek ◽  
Massimo Tallarida ◽  
Konstantin Karavaev ◽  
Dieter Schmeisser
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Force Microscope ◽  
High Vacuum ◽  
Atomic Layer ◽  
Ultra High Vacuum ◽  
In Situ Studies ◽  
Atomic Force ◽  
Layer Deposition

scholarly journals Length-extension resonator as a force sensor for high-resolution frequency-modulation atomic force microscopy in air

2016 ◽  
Vol 7 ◽  
pp. 432-438 ◽  
Author(s):  
Hannes Beyer ◽  
Tino Wagner ◽  
Andreas Stemmer
Keyword(s):  
Atomic Force Microscopy ◽  
High Resolution ◽  
Frequency Modulation ◽  
High Vacuum ◽  
Force Sensor ◽  
Ultra High Vacuum ◽  
Dew Point ◽  
Ambient Conditions ◽  
Force Microscopy ◽  
Atomic Force

Frequency-modulation atomic force microscopy has turned into a well-established method to obtain atomic resolution on flat surfaces, but is often limited to ultra-high vacuum conditions and cryogenic temperatures. Measurements under ambient conditions are influenced by variations of the dew point and thin water layers present on practically every surface, complicating stable imaging with high resolution. We demonstrate high-resolution imaging in air using a length-extension resonator operating at small amplitudes. An additional slow feedback compensates for changes in the free resonance frequency, allowing stable imaging over a long period of time with changing environmental conditions.

The High Resolution Scanning Transmission Electron Microscope

1974 ◽  
Vol 32 ◽  
pp. 316-317
Author(s):  
A. V. Crewe
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
High Vacuum ◽  
Scanning Transmission Electron Microscope ◽  
Ultra High Vacuum ◽  
Resolving Power ◽  
Imaging Characteristics ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
The Moment

The high resolution STEM is now a fact of life. I think that we have, in the last few years, demonstrated that this instrument is capable of the same resolving power as a CEM but is sufficiently different in its imaging characteristics to offer some real advantages.It seems possible to prove in a quite general way that only a field emission source can give adequate intensity for the highest resolution^ and at the moment this means operating at ultra high vacuum levels. Our experience, however, is that neither the source nor the vacuum are difficult to manage and indeed are simpler than many other systems and substantially trouble-free.

TiO2/SiO2 multilayer as an antireflective and protective coating deposited by microwave assisted magnetron sputtering

2013 ◽  
Vol 21 (2) ◽  
Author(s):  
M. Mazur ◽  
D. Wojcieszak ◽  
J. Domaradzki ◽  
D. Kaczmarek ◽  
S. Song ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Vacuum ◽  
Visible Spectrum ◽  
Ultra High Vacuum ◽  
Protective Film ◽  
Wetting Properties ◽  
Microwave Assisted ◽  
Atomic Force ◽  
Packed Structure ◽  
Protective Performance

AbstractIn this paper designing, preparation and characterization of multifunctional coatings based on TiO2/SiO2 has been described. TiO2 was used as a high index material, whereas SiO2 was used as a low index material. Multilayers were deposited on microscope slide substrates by microwave assisted reactive magnetron sputtering process. Multilayer design was optimized for residual reflection of about 3% in visible spectrum (450–800 nm). As a top layer, TiO2 with a fixed thickness of 10 nm as a protective film was deposited. Based on transmittance and reflectance spectra, refractive indexes of TiO2 and SiO2 single layers were calculated. Ultra high vacuum atomic force microscope was used to characterize the surface properties of TiO2/SiO2 multilayer. Surface morphology revealed densely packed structure with grains of about 30 nm in size. Prepared samples were also investigated by nanoindentation to evaluate their protective performance against external hazards. Therefore, the hardness of the thin films was measured and it was equal to 9.34 GPa. Additionally, contact angle of prepared coatings has been measured to assess the wetting properties of the multilayer surface.

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