scholarly journals Direct-write polymer nanolithography in ultra-high vacuum

2012 ◽  
Vol 3 ◽  
pp. 52-56 ◽  
Author(s):  
Woo-Kyung Lee ◽  
Minchul Yang ◽  
Arnaldo R Laracuente ◽  
William P King ◽  
Lloyd J Whitman ◽  
...  
Keyword(s):  
Atomic Force Microscope ◽  
Silicon Oxide ◽  
High Vacuum ◽  
Polymer Chains ◽  
Ultra High Vacuum ◽  
Direct Write ◽  
Polymer Nanostructures ◽  
Atomic Force

Polymer nanostructures were directly written onto substrates in ultra-high vacuum. The polymer ink was coated onto atomic force microscope (AFM) probes that could be heated to control the ink viscosity. Then, the ink-coated probes were placed into an ultra-high vacuum (UHV) AFM and used to write polymer nanostructures on surfaces, including surfaces cleaned in UHV. Controlling the writing speed of the tip enabled the control over the number of monolayers of the polymer ink deposited on the surface from a single to tens of monolayers, with higher writing speeds generating thinner polymer nanostructures. Deposition onto silicon oxide-terminated substrates led to polymer chains standing upright on the surface, whereas deposition onto vacuum reconstructed silicon yielded polymer chains aligned along the surface.

scholarly journals Set-up of a high-resolution 300 mK atomic force microscope in an ultra-high vacuum compatible 3He/10 T cryostat

2016 ◽  
Vol 87 (7) ◽  
pp. 073702 ◽  
Author(s):  
H. von Allwörden ◽  
K. Ruschmeier ◽  
A. Köhler ◽  
T. Eelbo ◽  
A. Schwarz ◽  
...  
Keyword(s):  
High Resolution ◽  
Atomic Force Microscope ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Atomic Force ◽  
Set Up

The Role of Plastic Deformation in Nanometer-Scale Wear

2010 ◽  
Vol 64 ◽  
pp. 25-32 ◽  
Author(s):  
Philip Egberts ◽  
Roland Bennewitz
Keyword(s):  
Plastic Deformation ◽  
Atomic Force Microscope ◽  
Edge Dislocation ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Nanometer Scale ◽  
Single Asperity ◽  
Atomic Force ◽  
Low Load

Scratches on KBr(100) surfaces were produced and examined with an atomic force microscope (AFM) operated in an ultra-high vacuum (UHV) environment. Scratches with lengths on the order of 100s of nanometers and depths on the order of atomic layers were investigated. Non-contact AFM topographic images of scratches revealed screw and edge dislocation activity around the scratch sites, illuminating the role of plastic deformation in wear processes. Friction coefficients of approximately 0.3 were measured during scratching, more comparable to macroscopic friction experiments than those measured in low-load, single asperity experiments.

Ambient-pressure atomic force microscope with variable pressure from ultra-high vacuum up to one bar

2018 ◽  
Vol 89 (10) ◽  
pp. 103701 ◽  
Author(s):  
Joong Il Jake Choi ◽  
Jeong Jin Kim ◽  
Wooseok Oh ◽  
Won Hui Doh ◽  
Jeong Young Park
Keyword(s):  
Atomic Force Microscope ◽  
Ambient Pressure ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Variable Pressure ◽  
Atomic Force

In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope

2010 ◽  
Vol 518 (16) ◽  
pp. 4688-4691 ◽  
Author(s):  
Krzysztof Kolanek ◽  
Massimo Tallarida ◽  
Konstantin Karavaev ◽  
Dieter Schmeisser
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Force Microscope ◽  
High Vacuum ◽  
Atomic Layer ◽  
Ultra High Vacuum ◽  
In Situ Studies ◽  
Atomic Force ◽  
Layer Deposition

TiO2/SiO2 multilayer as an antireflective and protective coating deposited by microwave assisted magnetron sputtering

2013 ◽  
Vol 21 (2) ◽  
Author(s):  
M. Mazur ◽  
D. Wojcieszak ◽  
J. Domaradzki ◽  
D. Kaczmarek ◽  
S. Song ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Vacuum ◽  
Visible Spectrum ◽  
Ultra High Vacuum ◽  
Protective Film ◽  
Wetting Properties ◽  
Microwave Assisted ◽  
Atomic Force ◽  
Packed Structure ◽  
Protective Performance

AbstractIn this paper designing, preparation and characterization of multifunctional coatings based on TiO2/SiO2 has been described. TiO2 was used as a high index material, whereas SiO2 was used as a low index material. Multilayers were deposited on microscope slide substrates by microwave assisted reactive magnetron sputtering process. Multilayer design was optimized for residual reflection of about 3% in visible spectrum (450–800 nm). As a top layer, TiO2 with a fixed thickness of 10 nm as a protective film was deposited. Based on transmittance and reflectance spectra, refractive indexes of TiO2 and SiO2 single layers were calculated. Ultra high vacuum atomic force microscope was used to characterize the surface properties of TiO2/SiO2 multilayer. Surface morphology revealed densely packed structure with grains of about 30 nm in size. Prepared samples were also investigated by nanoindentation to evaluate their protective performance against external hazards. Therefore, the hardness of the thin films was measured and it was equal to 9.34 GPa. Additionally, contact angle of prepared coatings has been measured to assess the wetting properties of the multilayer surface.

Laser cleaning of exfoliated graphene

2012 ◽  
Vol 1455 ◽  
Author(s):  
Oliver Ochedowski ◽  
Benedict Kleine Bußmann ◽  
Marika Schleberger
Keyword(s):  
Local Heating ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ambient Conditions ◽  
Kelvin Probe ◽  
Structural Modifications ◽  
Force Microscopy ◽  
Exfoliated Graphene ◽  
Atomic Force ◽  
P Type

ABSTRACTWe have employed atomic force and Kelvin-Probe force microscopy to study graphene sheets exfoliated on TiO2 under the influence of local heating achieved by laser irradiation. Exfoliation and irradiation took place under ambient conditions, the measurements were performed in ultra high vacuum. We show that after irradiation times of 6 min, an increase of the surface potential is observed which indicates a decrease of p-type carrier concentration. We attribute this effect to the removal of adsorbates like water and oxygen. After irradiation times of 12 min our topography images reveal severe structural modifications of graphene. These resemble the nanocrystallite network which form on graphene/SiO2 but after much longer irradiation times. From our results we propose that short laser heating at moderate powers might offer a way to clean graphene without inducing unwanted structural modifications.

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