Nitrogenated amorphous carbon film by thermal chemical vapor deposition

2013 ◽  
Author(s):  
F. Mohamad ◽  
M. Rusop
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Amorphous Carbon Film ◽  
Thermal Chemical Vapor Deposition

The Effect of Camphor Oil Amounts on the Properties of Amorphous Carbon Thin Films by Thermal Chemical Vapor Deposition

2012 ◽  
Vol 576 ◽  
pp. 611-614
Author(s):  
K. Dayana ◽  
A.N. Fadzilah ◽  
Mohamad Rusop
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Thermal Chemical Vapor Deposition ◽  
Current Voltage ◽  
Carbon Thin Films ◽  
Camphor Oil

Amorphous carbon thin films have been deposited by a simple Thermal Chemical Vapor Deposition (CVD) with varying the amount of natural precursor (camphor oil) onto the glass substrates. In this work, we have investigated the effect of different amount of camphor oil on the evolution of electrical conductivity and the optical and structural properties of amorphous carbon thin films. The amorphous carbon thin films were characterized by using current-voltage (I-V) measurement, UV-VIS-NIR spectroscopy and Raman spectroscopy. The current-voltage (I-V) study reveals that the highest electrical conductivity was deposited at 3 ml camphor oil. The optical band gap is almost unchanged with the increase of camphor oil amount. Raman result indicates that amorphous carbon thin films consists a mixture of sp2 and sp3 bonded carbon atoms.

Diamond Nucleation During Biased Chemical Vapor Deposition

1992 ◽  
Vol 280 ◽  
Author(s):  
Roseann Csencsits ◽  
Janet Rankin ◽  
Rachel E. Boekenhauer ◽  
Michael K. Kundmann ◽  
Brian W. Sheldon
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Amorphous Film ◽  
Amorphous Layer ◽  
Carbon Layer ◽  
Diamond Nucleation

ABSTRACTThe initial stages of bias-enhanced chemical vapor deposition (CVD) of diamond were investigated in a microwave-plasma system. Samples were characterized with TEM and concurrent electron energy loss spectroscopy (EELS) to characterize chemical bonding in the deposited material. The results show that a thin amorphous carbon film is deposited during biasing, and that diamond nucleation occurs on this amorphous film. Isolated regions of crystalline SiC within the amorphous layer were also observed at longer bias times. These regions apparently form by a reaction between the amorphous carbon layer and the silicon substrate.

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