Effect of top gate potential on bias-stress for dual gate amorphous indium-gallium-zinc-oxide thin film transistor
Keyword(s):
Keyword(s):
2011 ◽
Vol 42
(1)
◽
pp. 1136-1139
◽
Keyword(s):
Keyword(s):
Keyword(s):
2020 ◽
Vol 41
(6)
◽
pp. 856-859
◽
Keyword(s):