Growth of highly aligned vertical Si-Nanorods and random Si-Nanowires by ICP-Plasma chemical etching of c-Si wafers
2018 ◽
Vol 1124
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pp. 041024
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2019 ◽
Vol 1368
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pp. 022060
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2016 ◽
Vol 89
(8)
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pp. 1317-1321
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