Calculating the Nominal Values of the Matching Device Installation of Plasma Chemical Etching
. The calculation of nominal values of the matching device for the modified plasma chemical etching installation "Plasma 600T" was based on the estimated values of the discharge impedance (plasma). It turned out that for optimal performance, one can use a matching device consisting of two capacitors whose capacitances are: С1 [20; 1000] pF, С2 [4; 100] pF, and inductor with inductance 2,5 μH.
2018 ◽
Vol 1124
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pp. 041024
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2019 ◽
Vol 1368
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pp. 022060
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2016 ◽
Vol 89
(8)
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pp. 1317-1321
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