The study of influence of the gas flow rate to etched layer thickness, and roughness of the anisotropy field of gallium arsenide is etched in the plasma chemical etching process

The study focuses on the processes of plasma-chemical etching of silver films for the manufacture of photonic elements --- nanoscale light sources, and examines the theoretical foundations of etching processes and the process of plasma formation in plasma-chemical etching facilities. We assessed the introduced technology when forming topological elements in thin films of silver metal, and identified key problems, such as redeposition and non-volatility of the material. The paper presents the results of simulating the etching process for several critical submicron sizes, and, based on the simulation results, shows the dependences of the etching rates on the power of the plasma sources. The focus is on the formation of holes to create a nanoscale light source. Both positive and negative properties of the plasma-chemical etching method using a source of inductive-coupled plasma are considered, and the features of technological facilities used for these processes are outlined. The process of formation of nanoelements in a silver film and the effect of redeposition of material particles as a result of ion sputtering are considered. We propose a two-stage etching process, which makes it possible to form a vertical profile of the walls of the manufactured elements and to avoid the effect of redeposition. We also give recommendations for the processes of etching through an electron-beam resist in facilities with an inductive-coupled plasma source. By optimizing the thicknesses of the resistive mask and plasma sources, we obtained the results of etching nanoscale elements with preservation of geometric shapes

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EFFECTS OF METHANE GAS FLOW RATE ON THE OPTOELECTRICAL PROPERTIES OF NITROGENATED CARBON THIN FILMS GROWN BY SURFACE WAVE MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

Surface Review and Letters ◽

10.1142/s0218625x06008530 ◽

2006 ◽

Vol 13 (05) ◽

pp. 585-592

Author(s):

M. RUSOP ◽

S. ABDULLAH ◽

A. M. M. OMER ◽

S. ADHIKARI ◽

T. SOGA ◽

...

Keyword(s):

Surface Wave ◽

Electrical Properties ◽

Flow Rate ◽

Vapor Deposition ◽

Gas Flow ◽

Microwave Plasma ◽

Chemical Vapor ◽

Gas Flow Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

We have studied the influence of the methane gas ( CH 4) flow rate on the composition and structural and electrical properties of nitrogenated amorphous carbon ( a - C : N ) films grown by surface wave microwave plasma chemical vapor deposition (SWMP-CVD) using Auger electron spectroscopy, X-ray photoelectron spectroscopy, UV-visible spectroscopy, four-point probe and two-probe method resistance measurement. The photoelectrical properties of a - C : N films were also studied. We have succeeded to grow a - C : N films using a novel method of SWMP-CVD at room temperature and found that the deposition rate, bonding and optical and electrical properties of a - C : N films are strongly dependent on the CH 4 gas sources, and the a - C : N films grown at higher CH 4 gas flow rate have relatively high electrical conductivity for both cases of in dark and under illumination condition.

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Plasma Chemical Etching of Gallium Arsenide in C2F5Cl-Based Inductively Coupled Plasma

Semiconductors ◽

10.1134/s1063782618110180 ◽

2018 ◽

Vol 52 (11) ◽

pp. 1473-1476

Author(s):

A. I. Okhapkin ◽

P. A. Yunin ◽

M. N. Drozdov ◽

S. A. Kraev ◽

E. V. Skorokhodov ◽

...

Keyword(s):

Gallium Arsenide ◽

Inductively Coupled Plasma ◽

Chemical Etching ◽

Plasma Chemical ◽

Inductively Coupled ◽

Plasma Chemical Etching

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Plasma-Chemical Etching Process Behavioral Models Based on Tree Ensembles and Neural Network

2018 XIV International Scientific-Technical Conference on Actual Problems of Electronics Instrument Engineering (APEIE) ◽

10.1109/apeie.2018.8546139 ◽

2018 ◽

Author(s):

Artyom A. Popov ◽

Dmitry V. Bilevich ◽

Andrei S. Salnikov ◽

Alexey A. Kalentyev ◽

Dmitry V. Garays

Keyword(s):

Neural Network ◽

Chemical Etching ◽

Etching Process ◽

Behavioral Models ◽

Plasma Chemical ◽

Plasma Chemical Etching

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SCIENTIFIC AND ENGINEERING PRINCIPLES OF EFFICIENT FUEL USE AND ENVIRONMENTALLY FRIENDLY GAS COMBUSTION IN STOVE PLATES. PART 1. MODERN STATE-OF-THE-ART AND DIRECTIONS FOR IMPROVEMENT THE GAS BURNING IN DOMESTIC GAS COOKERS

Energy Technologies & Resource Saving ◽

10.33070/etars.3.2017.01 ◽

2017 ◽

pp. 3-18 ◽

Cited By ~ 1

Author(s):

B.S. Soroka ◽

V.V. Horupa

Keyword(s):

Natural Gas ◽

Flow Rate ◽

Gas Flow ◽

Renewable Energy Sources ◽

Combustion Process ◽

Orifice Diameter ◽

Firing Process ◽

Gas Flow Rate ◽

Gas Combustion ◽

Gas Stoves

Natural gas NG consumption in industry and energy of Ukraine, in recent years falls down as a result of the crisis in the country’s economy, to a certain extent due to the introduction of renewable energy sources along with alternative technologies, while in the utility sector the consumption of fuel gas flow rate enhancing because of an increase the number of consumers. The natural gas is mostly using by domestic purpose for heating of premises and for cooking. These items of the gas utilization in Ukraine are already exceeding the NG consumption in industry. Cooking is proceeding directly in the living quarters, those usually do not meet the requirements of the Ukrainian norms DBN for the ventilation procedures. NG use in household gas stoves is of great importance from the standpoint of controlling the emissions of harmful components of combustion products along with maintenance the satisfactory energy efficiency characteristics of NG using. The main environment pollutants when burning the natural gas in gas stoves are including the nitrogen oxides NOx (to a greater extent — highly toxic NO2 component), carbon oxide CO, formaldehyde CH2O as well as hydrocarbons (unburned UHC and polyaromatic PAH). An overview of environmental documents to control CO and NOx emissions in comparison with the proper norms by USA, EU, Russian Federation, Australia and China, has been completed. The modern designs of the burners for gas stoves are considered along with defining the main characteristics: heat power, the natural gas flow rate, diameter of gas orifice, diameter and spacing the firing openings and other parameters. The modern physical and chemical principles of gas combustion by means of atmospheric ejection burners of gas cookers have been analyzed from the standpoints of combustion process stabilization and of ensuring the stability of flares. Among the factors of the firing process destabilization within the framework of analysis above mentioned, the following forms of unstable combustion/flame unstabilities have been considered: flashback, blow out or flame lifting, and the appearance of flame yellow tips. Bibl. 37, Fig. 11, Tab. 7.

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