Numerical study of plasma-fluid characteristics and thrust performance of a low-power argon inductively coupled plasma electrothermal thruster

Journal of Applied Physics ◽

10.1063/5.0022018 ◽

2020 ◽

Vol 128 (17) ◽

pp. 173302

Author(s):

T. Fujino ◽

M. Yamauchi

Keyword(s):

Low Power ◽

Inductively Coupled Plasma ◽

Numerical Study ◽

Inductively Coupled ◽

Thrust Performance ◽

Fluid Characteristics

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Low resistivity contacts to plasma etched Mg-doped GaN using very low power inductively coupled plasma etching

Thin Solid Films ◽

10.1016/j.tsf.2011.01.276 ◽

2011 ◽

Vol 519 (11) ◽

pp. 3686-3689 ◽

Author(s):

A. Baharin ◽

R.S. Pinto ◽

U.K. Mishra ◽

B.D. Nener ◽

G. Parish

Keyword(s):

Low Power ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Inductively Coupled Plasma Etching ◽

Low Resistivity ◽

Inductively Coupled ◽

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Numerical Study of the Effects of Frequency in Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.1358 ◽

2000 ◽

Vol 39 (Part 1, No. 3A) ◽

pp. 1358-1364 ◽

Author(s):

Jin-Sung Oh ◽

Toshiaki Makabe

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Inductively Coupled Plasma ◽

Numerical Study ◽

Particle In Cell ◽

Inductively Coupled

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Novel low power/reduced pressure inductively coupled plasma ionization source for mass spectrometric detection of organotin species

Journal of Analytical Atomic Spectrometry ◽

10.1039/a802222d ◽

1998 ◽

Vol 13 (9) ◽

pp. 879-883 ◽

Author(s):

Joseph W. Waggoner ◽

Mikhail Belkin ◽

Karen L. Sutton ◽

Harry B. Fannin

Keyword(s):

Low Power ◽

Inductively Coupled Plasma ◽

Mass Spectrometric ◽

Mass Spectrometric Detection ◽

Ionization Source ◽

Reduced Pressure ◽

Plasma Ionization ◽

Inductively Coupled ◽

Organotin Species

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A low-power oxygen inductively coupled plasma for spectrochemical analysis-I. Computer simulation

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(89)80108-9 ◽

1989 ◽

Vol 44 (11) ◽

pp. 1081-1091 ◽

Author(s):

Pengyuan Yang ◽

Ramon M. Barnes

Keyword(s):

Computer Simulation ◽

Low Power ◽

Inductively Coupled Plasma ◽

Spectrochemical Analysis ◽

Inductively Coupled

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A Numerical Study of a Collision-Dominated Inductively Coupled Plasma Using Particle-in-Cell/Monte Carlo Simulation

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.4423 ◽

1999 ◽

Vol 38 (Part 1, No. 7B) ◽

pp. 4423-4428

Author(s):

Jin-Sung Oh ◽

Toshiaki Makabe

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Inductively Coupled Plasma ◽

Numerical Study ◽

Particle In Cell ◽

Inductively Coupled

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Interferences in a low-flow, low-power inductively coupled plasma

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(85)80011-2 ◽

1985 ◽

Vol 40 (1-2) ◽

pp. 73-83 ◽

Author(s):

R. Rezaaiyaan ◽

J.W. Olesik ◽

G.M. Hieftje

Keyword(s):

Low Power ◽

Inductively Coupled Plasma ◽

Low Flow ◽

Inductively Coupled

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Effect of very low power inductively coupled plasma etching on ohmic contacts to p-GaN

2010 Conference on Optoelectronic and Microelectronic Materials and Devices ◽

10.1109/commad.2010.5699708 ◽

2010 ◽

Author(s):

A. Baharin ◽

R.S. Pinto ◽

U.K. Mishra ◽

B.D. Nener ◽

G. Parish

Keyword(s):

Low Power ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Ohmic Contacts ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Synthesis of carbon nitride films by low-power inductively coupled plasma-activated transport reactions from a solid carbon source

Applied Physics A ◽

10.1007/s003390050997 ◽

1999 ◽

Vol 69 (2) ◽

pp. 241-244 ◽

Author(s):

C. Popov ◽

M.F. Plass ◽

A. Bergmaier ◽

W. Kulisch

Keyword(s):

Carbon Source ◽

Low Power ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Solid Carbon ◽

Inductively Coupled ◽

Solid Carbon Source

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Study of Pd/Au metallisation and surface characteristics on Mg-doped GaN induced by low power inductively coupled plasma etching

Optical Materials ◽

10.1016/j.optmat.2009.04.014 ◽

2010 ◽

Vol 32 (6) ◽

pp. 700-702 ◽

Author(s):

A. Baharin ◽

M. Kocan ◽

U.K. Mishra ◽

G. Parish ◽

B.D. Nener

Keyword(s):

Low Power ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Surface Characteristics ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled ◽

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Use of spatial emission profiles and a nomenclature system as aids in interpreting matrix effects in the low-power argon inductively coupled plasma

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(81)80007-9 ◽

1981 ◽

Vol 36 (1) ◽

pp. 49-59 ◽

Author(s):

S.R. Koirtyohann ◽

J. Stephen Jones ◽

Colleen P. Jester ◽

Dennis A. Yates

Keyword(s):

Low Power ◽

Inductively Coupled Plasma ◽

Matrix Effects ◽

Nomenclature System ◽

Inductively Coupled

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