Optical characterization of Ba0.5Sr0.5TiO3 material grown on a p-type silicon substrate (111) doped niobium oxide and chlorophyll

2020 ◽  
Vol 568 (1) ◽  
pp. 62-70
Author(s):  
Aep Setiawan ◽  
Endah Kinarya Palupi ◽  
Rofiqul Umam ◽  
Husin Alatas ◽  
Irzaman
Keyword(s):  
Silicon Substrate ◽  
Niobium Oxide ◽  
Optical Characterization ◽  
Type Silicon ◽  
P Type

scholarly journals Fabrication and Characterization of PZN-4.5PT Inorganic Perovskites Nanoparticles Thin Films Deposited on P-Type Silicon Substrate

2018 ◽  
Vol 09 (02) ◽  
pp. 259-272
Author(s):  
Rémi Ndioukane ◽  
Moussa Touré ◽  
Diouma Kobor ◽  
Laurence Motte ◽  
Marcel Pasquinelli ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Substrate ◽  
Type Silicon ◽  
Fabrication And Characterization ◽  
P Type

Magneto-Optical Characterization of the Nitrogen-Related Impurities in p-Type ZnSe Epilayers

2000 ◽  
Vol 180 (1) ◽  
pp. 195-199 ◽  
Author(s):  
L. Gravier ◽  
H. Makino ◽  
K. Arai ◽  
H. Sasaki ◽  
K. Kimura ◽  
...  
Keyword(s):  
Optical Characterization ◽  
Related Impurities ◽  
P Type

Study of nanoparticles TiO2 thin films on p-type silicon substrate using different alcoholic solvents

2016 ◽  
Author(s):  
A. K. M. Muaz ◽  
U. Hashim ◽  
M. K. Md. Arshad ◽  
A. R. Ruslinda ◽  
R. M. Ayub ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Substrate ◽  
Tio2 Thin Films ◽  
Type Silicon ◽  
P Type

Electrical and Optical Characterization of p-Type Boron-Doped 6H-SiC Bulk Crystals

2003 ◽  
Vol 433-436 ◽  
pp. 337-340 ◽  
Author(s):  
Matthias Bickermann ◽  
Roland Weingärtner ◽  
Z.G. Herro ◽  
Dieter Hofmann ◽  
Ulrike Künecke ◽  
...  
Keyword(s):  
Optical Characterization ◽  
Bulk Crystals ◽  
Boron Doped ◽  
P Type

Electronic Characterization of Defects in Iron-Doped P-Type Silicon

1991 ◽  
Vol 38-41 ◽  
pp. 373-378 ◽  
Author(s):  
W. Gehlhoff ◽  
K. Irmscher ◽  
U. Rehse
Keyword(s):  
Type Silicon ◽  
Iron Doped ◽  
P Type

Characterization of internal gettering of copper in the vertical direction of p-type silicon wafer

2018 ◽  
Vol 148 ◽  
pp. 35-42 ◽  
Author(s):  
Jung Gyu Jung ◽  
Kisang Lee ◽  
Boyoung Lee ◽  
Ho Seong Lee
Keyword(s):  
Silicon Wafer ◽  
Vertical Direction ◽  
Type Silicon ◽  
P Type

Influence of Hf and H2O2 on Morphology of Silicon Formed by Ag Assisted Chemical Etching

2014 ◽  
Vol 953-954 ◽  
pp. 1045-1048
Author(s):  
Guo Feng Ma ◽  
Heng Ye ◽  
Hong Lin Zhang ◽  
Chun Lin He ◽  
Li Na Sun
Keyword(s):  
Silicon Substrate ◽  
Room Temperature ◽  
Electroless Deposition ◽  
Metal Salt ◽  
Substrate Surface ◽  
Volume Ratio ◽  
Type Silicon ◽  
P Type ◽  
Silicon Substrate Surface ◽  
Si Wafer

The Ag-assisted electroless etching of p-type silicon substrate in HF/H2O2solution at room temperature was investigated. In this work, the effects of HF, H2O2and their volume ratio on morphology and growth of p-type silicon substrate surface by using metal assisted etching were investigated in order to produce a highly efficient antireflecting structure. The Ag metal particles were deposited onto Si wafer by electroless deposition from a metal salt solution including HF. The experimental results show that the growth rate and morphology of the pores formed on the Ag metalized Si surfaces are strongly dependent on the volume ratio of HF and H2O2.

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