Dynamical Systems Approach to Particle Transport Modeling in Dilute Gas-Particle Flows with Application to a Chemical Vapor Deposition Reactor

Aerosol Science and Technology ◽

10.1080/02786829708965454 ◽

1997 ◽

Vol 27 (1) ◽

pp. 1-21 ◽

Author(s):

T. J. Burns ◽

R. W. Davis ◽

E. F. Moore

Keyword(s):

Chemical Vapor Deposition ◽

Dynamical Systems ◽

Vapor Deposition ◽

Particle Transport ◽

Systems Approach ◽

Chemical Vapor ◽

Transport Modeling ◽

Chemical Vapor Deposition Reactor ◽

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Dynamical Systems Approach to Particle Transport Modeling in Dilute Gas-Particle Flows with Application to a Chemical Vapor Deposition Reactor

Aerosol Science and Technology ◽

10.1080/02786829708965425 ◽

1997 ◽

Vol 26 (3) ◽

pp. 193-211 ◽

Author(s):

T. J. Burns ◽

R. W. Davis ◽

E. F. Moore

Keyword(s):

Chemical Vapor Deposition ◽

Dynamical Systems ◽

Vapor Deposition ◽

Particle Transport ◽

Systems Approach ◽

Chemical Vapor ◽

Transport Modeling ◽

Chemical Vapor Deposition Reactor ◽

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Visualization and numerical simulation of fine particle transport in a low-pressure parallel plate chemical vapor deposition reactor

Chemical Engineering Science ◽

10.1016/s0009-2509(01)00373-6 ◽

2002 ◽

Vol 57 (3) ◽

pp. 497-506 ◽

Author(s):

Heru Setyawan ◽

Manabu Shimada ◽

Kenji Ohtsuka ◽

Kikuo Okuyama

Keyword(s):

Numerical Simulation ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Particle Transport ◽

Fine Particle ◽

Parallel Plate ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor

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a-Si thin film transistors using dilute-gas plasma-enhanced chemical vapor deposition

10.1109/drc.1993.1009602 ◽

2005 ◽

Author(s):

S.L. Wright ◽

M.B. Rothwell ◽

I.H. Souk ◽

Y. Kuo

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thin Film Transistors ◽

Chemical Vapor ◽

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Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Materials Science Forum ◽

10.4028/www.scientific.net/msf.514-516.475 ◽

2006 ◽

Vol 514-516 ◽

pp. 475-482 ◽

Author(s):

Pedro Alpuim ◽

M. Ribeiro ◽

Sergej Filonovich

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Flexible Substrates ◽

Hot Wire ◽

Chemical Vapor Deposition Reactor ◽

Deposition Parameters ◽

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The Effect of Thermophoresis on Particle Deposition in a Tungsten Low Pressure Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.1392026 ◽

1999 ◽

Vol 146 (8) ◽

pp. 2901-2905 ◽

Author(s):

B. S. MacGibbon ◽

A. A. Busnaina ◽

B. Fardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Particle Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Pressure Chemical

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Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale Approach

Industrial & Engineering Chemistry Research ◽

10.1021/ie8015522 ◽

2009 ◽

Vol 48 (13) ◽

pp. 5969-5974 ◽

Author(s):

Yousef Sharifi ◽

Luke Achenie

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Particle Dynamics ◽

Multiscale Approach ◽

Chemical Vapor Deposition Reactor

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Optimizing the gas phase chemistry in a d.c. arcjet diamond chemical vapor deposition reactor

Thin Solid Films ◽

10.1016/0040-6090(94)90302-6 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 103-108 ◽

Author(s):

Scott W. Reeve ◽

Wayne A. Weimer

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Diamond Chemical Vapor Deposition

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DEVELOPMENT OF PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION REACTOR FOR PREPARATION OF OXYGEN CONTAINING ORGANOSILAZANE POLYMER THIN FILMS

NANOCON 2019 Conference Proeedings ◽

10.37904/nanocon.2019.8749 ◽

2020 ◽

Author(s):

Roman PŘIBYL ◽

Štěpánka KELAROVÁ ◽

Vojtěch HOMOLA ◽

Vilma BURŠÍKOVÁ

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polymer Thin Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Kinetics of silicon epitaxy using SiH4in a rapid thermal chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.102719 ◽

1990 ◽

Vol 56 (7) ◽

pp. 629-631 ◽

Author(s):

M. Liehr ◽

C. M. Greenlief ◽

S. R. Kasi ◽

M. Offenberg

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Thermal Chemical Vapor Deposition ◽

Silicon Epitaxy ◽

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Temperature optimization in an azimuthally symmetric single‐wafer chemical vapor deposition reactor: The low pressure regime

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577682 ◽

1992 ◽

Vol 10 (4) ◽

pp. 843-849 ◽

Author(s):

David E. Kotecki ◽

Steven G. Barbee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Temperature Optimization ◽

Pressure Regime

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