Irradiation effects of 6 mev-electrons on optical and electrical properties of TiO2/Al2o3 multilayer thin films

Author(s):  
P. Laha ◽  
S. K. Mahapatra ◽  
I. Banerjee ◽  
V. N. Bhoraskar
2016 ◽  
Vol 51 ◽  
pp. 55-59 ◽  
Author(s):  
Mingsong Wang ◽  
Jianyu Ji ◽  
Shuaijun Luo ◽  
Lingxia Jiang ◽  
Jiangtao Ma ◽  
...  

2007 ◽  
Vol 124-126 ◽  
pp. 403-406 ◽  
Author(s):  
Yong Lak Choi ◽  
Seon Hwa Kim

ITO monolayer and ITO/Ag/ITO multilayer thin films are prepared by D.C. magnetron sputtering method, optical and electrical properties were estimated with different crystalline properties and microstructures. The coated Ag layer thickness was around 50 , and the surface of ITO/Ag/ITO thin film had the very fine island morphology. The growth of columnar phase was inhibited, and most of phases were amorphous. The carrier concentration increased above 10 times because of the effect of Ag layer, and the observed sheet resistance gave much lower value of below 4 / compared to that of coated crystalline ITO thin film that was 10 / , and the transmittance was 80%.


2018 ◽  
Vol 1 (1) ◽  
pp. 26-31 ◽  
Author(s):  
B Babu ◽  
K Mohanraj ◽  
S Chandrasekar ◽  
N Senthil Kumar ◽  
B Mohanbabu

CdHgTe thin films were grown onto glass substrate via the Chemical bath deposition technique. XRD results indicate that a CdHgTe formed with a cubic polycrystalline structure. The crystallinity of CdHgTe thin films is gradually deteriorate with increasing the gamma irradiation. EDS spectrums confirms the presence of Cd, Hg and Te elements. DC electrical conductivity results depicted the conductivity of CdHgTe increase with increasing a gamma ray dosage


Materials ◽  
2021 ◽  
Vol 14 (4) ◽  
pp. 766
Author(s):  
Tihomir Car ◽  
Ivan Jakovac ◽  
Ivana Šarić ◽  
Sigrid Bernstorff ◽  
Maja Micetic

Structural, optical and electrical properties of Al+MoO3 and Au+MoO3 thin films prepared by simultaneous magnetron sputtering deposition were investigated. The influence of MoO3 sputtering power on the Al and Au nanoparticle formation and spatial distribution was explored. We demonstrated the formation of spatially arranged Au nanoparticles in the MoO3 matrix, while Al incorporates in the MoO3 matrix without nanoparticle formation. The dependence of the Au nanoparticle size and arrangement on the MoO3 sputtering power was established. The Al-based films show a decrease of overall absorption with an Al content increase, while the Au-based films have the opposite trend. The transport properties of the investigated films also are completely different. The resistivity of the Al-based films increases with the Al content, while it decreases with the Au content increase. The reason is a different transport mechanism that occurs in the films due to their different structural properties. The choice of the incorporated material (Al or Au) and its volume percentage in the MoO3 matrix enables the design of materials with desirable optical and electrical characteristics for a variety of applications.


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