Numerical investigation of relationship between micro-scale pattern, interfacial plasma structure and feature profile during deep-Si etching in two-frequency capacitively coupled plasmas in SF6/O2
2009 ◽
Vol 42
(7)
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pp. 075201
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2015 ◽
Vol 33
(2)
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pp. 021310
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Keyword(s):
2010 ◽
Vol 37
(2)
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pp. 169-172
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2004 ◽
Vol 32
(1)
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pp. 90-100
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Keyword(s):
2015 ◽
Vol 24
(4)
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pp. 045013
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Keyword(s):