Real poly(p-phenylene vinylene) features from near-field scanning optical lithography and the implications for further modelling

Abstract Due to its ability of recording images of surfaces with subwavelength resolution, near-field scanning optical lithography (NSOL) provides a prospective solution for nanolithography. A variety of different photolithography processes at the nanoscale have been realized. However, the development of polymerization at optical near field is yet an unexplored area to researchers. In this paper, we report a series of computerized simulations to investigate some basic phenomena in NSOL. In this work, we introduce a cylindrical model to represent the metal-coated NSOM tip illuminated by a Gaussian beam. Using numerical method to solve the Maxwell equations to determine light intensity distribution, we applied the result of intensity profile for the first time to study the induced photo-polymerization from reaction kinetic equations of continuum media. We then studied the dependence of curing height and curing radius upon exposure time, with the optimized aperture size and tip sample distance. It has been demonstrated in this work the feasibility of nanolithography with NSOM tip, which would provide a new pathway to nanofabrication.

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Nanolithography With a NSOM Tip: Part II — Experiments

10.1115/imece2001/htd-24352 ◽

2001 ◽

Author(s):

Nicholas Fang ◽

Cheng Sun ◽

Zhiliang Wan ◽

Xiang Zhang

Keyword(s):

Optical Fiber ◽

Light Source ◽

Uv Light ◽

Near Field ◽

Solid Substrate ◽

Optical Lithography ◽

Positioning Control ◽

Photo Polymerization ◽

Tapered Optical Fiber ◽

Near Field Scanning

Abstract We present in this paper a nanolithographic method by introducing a local photo-polymerization in the proximity of tapered optical fiber tip immersed in photocurable resin. The metallic apertured tip, when approached to a solid substrate at a few nanometers distance, delivers UV light to the vicinity of the tip apex and forms a subwavelength light source. The confined light source permits the polymerization to occur locally at the tip extremity, thus allowing generation of micronic/nanometric polymer features. The nanometric positioning control, realized by a commercial AFM operating in tapping mode, ensures the automation of nanolithographic process. The preliminary results presented here validate the concept of near field scanning optical lithography.

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The origin of fine structure in near-field scanning optical lithography of an electroactive polymer

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/41/19/195107 ◽

2008 ◽

Vol 41 (19) ◽

pp. 195107 ◽

Cited By ~ 5

Author(s):

Daniel V Cotton ◽

Christopher J Fell ◽

Warwick J Belcher ◽

Paul C Dastoor

Keyword(s):

Fine Structure ◽

Near Field ◽

Optical Lithography ◽

Electroactive Polymer ◽

Near Field Scanning

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High-resolution optical lithography with a near-field scanning subwavelength aperture

10.1117/12.138895 ◽

1993 ◽

Cited By ~ 5

Author(s):

Fred F. Froehlich ◽

Tomas D. Milster ◽

R. Uber

Keyword(s):

High Resolution ◽

Near Field ◽

Optical Lithography ◽

Subwavelength Aperture ◽

Near Field Scanning

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Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisotropic wet-etching process

Applied Physics A ◽

10.1007/s00339-006-3744-4 ◽

2006 ◽

Vol 86 (1) ◽

pp. 11-18 ◽

Cited By ~ 6

Author(s):

S.J. Kwon ◽

Y.M. Jeong ◽

S.H. Jeong

Keyword(s):

Aspect Ratio ◽

High Aspect Ratio ◽

Near Field ◽

Optical Lithography ◽

Wet Etching ◽

Etching Process ◽

Silicon Nanostructures ◽

Near Field Scanning

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Near-field scanning optical microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100144644 ◽

1986 ◽

Vol 44 ◽

pp. 642-643

Author(s):

E. Betzig ◽

A. Harootunian ◽

M. Isaacson ◽

A. Lewis

Keyword(s):

Near Field ◽

Optical Microscope ◽

Visible Radiation ◽

Field Methods ◽

Optical Elements ◽

Optical Region ◽

Order Of Magnitude ◽

Nondestructive Imaging ◽

Scanning Optical Microscopy ◽

Near Field Scanning

In general, conventional methods of optical imaging are limited in spatial resolution by either the wavelength of the radiation used or by the aberrations of the optical elements. This is true whether one uses a scanning probe or a fixed beam method. The reason for the wavelength limit of resolution is due to the far field methods of producing or detecting the radiation. If one resorts to restricting our probes to the near field optical region, then the possibility exists of obtaining spatial resolutions more than an order of magnitude smaller than the optical wavelength of the radiation used. In this paper, we will describe the principles underlying such "near field" imaging and present some preliminary results from a near field scanning optical microscope (NS0M) that uses visible radiation and is capable of resolutions comparable to an SEM. The advantage of such a technique is the possibility of completely nondestructive imaging in air at spatial resolutions of about 50nm.

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