A Spectroscopic Ellipsometry Study of TiO 2 Thin Films Prepared by dc Reactive Magnetron Sputtering: Annealing Temperature Effect

2007 ◽  
Vol 24 (6) ◽  
pp. 1505-1508 ◽  
Author(s):  
Mati Horprathum ◽  
Pongpan Chindaudom ◽  
Pichet Limsuwan
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Temperature Effect ◽  
Spectroscopic Ellipsometry ◽  
Annealing Temperature ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Influence of Annealing Temperature on Microstructural and Optical Properties of TiN Thin Films Deposited by DC Reactive Magnetron Sputtering

2013 ◽  
Vol 770 ◽  
pp. 197-200
Author(s):  
T. Rattana ◽  
N. Witit-Anun ◽  
S. Suwanboon ◽  
S. Chaiyakun
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Annealing Temperature ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Annealing Temperatures ◽  
Dc Reactive Magnetron Sputtering ◽  
Spherical Structures ◽  
Tin Thin Films

Polycrystalline TiN thin films were deposited on silicon and quartz substrates by DC reactive magnetron sputtering technique. The as-prepared thin films were annealed in air at various temperatures ranging between 400 °C to 700 °C. The effect of annealing temperatures on the microstructural and optical properties have been investigated by field emission scanning electron microscope, Raman scattering spectroscopy and UVVis spectrophotometer, respectively. The raman results indicated the presence of the rutile TiO2 phase for the samples annealed above 500°C. Many hollow-spherical structures appeared on the surface of films annealed at about 600 °C and the hollow-spherical structures occurred increasingly as a function of annealing temperatures. In addition, the optical properties of thin films depended strongly on annealing temperature.

Room temperature deposition of crystalline HfN thin films by DC reactive magnetron sputtering

2021 ◽  
Author(s):  
Wuttichai Phae-ngam ◽  
Tossaporn Lertvanithphol ◽  
Chanunthorn Chananonnawathorn ◽  
Rattanachai Kowong ◽  
Mati Horprathum ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering ◽  
Temperature Deposition

Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

2011 ◽  
Vol 13 (2) ◽  
pp. 314-320 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
A. Sivasankar Reddy ◽  
Kee-Sun Lee ◽  
P. Sreedhara Reddy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering
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