The growth of indium-tin-oxide thin films on glass substrates using DC reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2003.08.001 ◽

2003 ◽

Vol 72 (3) ◽

pp. 269-276 ◽

Author(s):

Ho-Chul Lee ◽

Ji-Yoon Seo ◽

Yong-Won Choi ◽

Dong-Wook Lee

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Glass Substrates ◽

Dc Reactive Magnetron Sputtering

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The behaviors of the carrier concentrations and mobilities in indium–tin-oxide thin films by DC and RF-superimposed DC reactive magnetron sputtering at the various process temperatures

Applied Surface Science ◽

10.1016/j.apsusc.2005.02.128 ◽

2006 ◽

Vol 252 (8) ◽

pp. 2647-2656 ◽

Author(s):

Ho-Chul Lee

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Dc Reactive Magnetron Sputtering

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Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect

Reactive Sputter Deposition - Springer Series in Materials Science ◽

10.1007/978-3-540-76664-3_10 ◽

2008 ◽

pp. 337-366

Author(s):

H. Kupfer ◽

F. Richter

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

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Relation between Plasma Parameters and Film Properties in DC Reactive Magnetron Sputtering of Indium-Tin-Oxide

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.4922 ◽

1997 ◽

Vol 36 (Part 1, No. 7B) ◽

pp. 4922-4927 ◽

Author(s):

Yoshinobu Matsuda ◽

Yasunari Yamori ◽

Madoka Muta ◽

Shinichi Ohgushi ◽

Hiroshi Fujiyama

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Plasma Parameters ◽

Film Properties ◽

Dc Reactive Magnetron Sputtering

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Physical properties of copper oxide thin films prepared by dc reactive magnetron sputtering under different oxygen partial pressures

Physica B Condensed Matter ◽

10.1016/j.physb.2009.08.185 ◽

2009 ◽

Vol 404 (23-24) ◽

pp. 4831-4834 ◽

Author(s):

Chun-Lung Chu ◽

Hsin-Chun Lu ◽

Chen-Yang Lo ◽

Chi-You Lai ◽

Yu-Hsiang Wang

Keyword(s):

Magnetron Sputtering ◽

Physical Properties ◽

Copper Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Partial Pressures ◽

Dc Reactive Magnetron Sputtering

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Preparation of p-type transparent conducting tin-antimony oxide thin films by DC reactive magnetron sputtering

physica status solidi (c) ◽

10.1002/pssc.200778884 ◽

2008 ◽

Vol 5 (10) ◽

pp. 3364-3367 ◽

Author(s):

Zhenguo Ji ◽

Junhua Xi ◽

Lijuan Huo ◽

Yi Zhao

Keyword(s):

Magnetron Sputtering ◽

Antimony Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Transparent Conducting ◽

Dc Reactive Magnetron Sputtering ◽

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Experimental and theoretical studies of the DC reactive magnetron sputtering deposition of silver oxide thin films

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00682-0 ◽

2003 ◽

Vol 174-175 ◽

pp. 1282-1286 ◽

Author(s):

R. Snyders ◽

M. Wautelet ◽

R. Gouttebaron ◽

J.P. Dauchot ◽

M. Hecq

Keyword(s):

Magnetron Sputtering ◽

Silver Oxide ◽

Reactive Magnetron Sputtering ◽

Theoretical Studies ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Sputtering Deposition ◽

Dc Reactive Magnetron Sputtering ◽

Experimental And Theoretical Studies

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Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2011.02.002 ◽

2011 ◽

Vol 85 (10) ◽

pp. 949-954 ◽

Author(s):

A. Mallikarjuna Reddy ◽

A. Sivasankar Reddy ◽

P. Sreedhara Reddy

Keyword(s):

Magnetron Sputtering ◽

Nickel Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Dc Reactive Magnetron Sputtering ◽

Nickel Oxide Thin Films

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Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide

Thin Solid Films ◽

10.1016/s0040-6090(98)01528-4 ◽

1999 ◽

Vol 341 (1-2) ◽

pp. 221-224 ◽

Author(s):

M. Muta ◽

S. Ohgushi ◽

Y. Matsuda ◽

H. Fujiyama

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Two Dimensional ◽

Reactive Magnetron ◽

Plasma Parameters ◽

Dc Reactive Magnetron Sputtering

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Structural, electrical and optical properties of zinc-iridium oxide thin films deposited by DC reactive magnetron sputtering

physica status solidi (c) ◽

10.1002/pssc.201300653 ◽

2014 ◽

Vol 11 (9-10) ◽

pp. 1493-1496 ◽

Author(s):

Martins Zubkins ◽

Roberts Kalendarev ◽

Jevgenijs Gabrusenoks ◽

Kaspars Vilnis ◽

Andris Azens ◽

...

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Iridium Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Electrical And Optical Properties ◽

Dc Reactive Magnetron Sputtering

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Annealing effects on properties of antimony tin oxide thin films deposited by RF reactive magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2003.11.004 ◽

2004 ◽

Vol 184 (2-3) ◽

pp. 188-193 ◽

Author(s):

Jow-Lay Huang ◽

Yi Pan ◽

Jia Yuan Chang ◽

Bao-Shun Yau

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Annealing Effects ◽

Antimony Tin Oxide

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