Gas mixture influence on the reactive ion etching of InSb in an inductively coupled methane-hydrogen plasma

2015 ◽  
Vol 30 (6) ◽  
pp. 065014 ◽  
Author(s):  
J Abautret ◽  
A Evirgen ◽  
J P Perez ◽  
Y Laaroussi ◽  
A Cordat ◽  
...  
Keyword(s):  
Hydrogen Plasma ◽  
Reactive Ion Etching ◽  
Gas Mixture ◽  
Ion Etching ◽  
Inductively Coupled

Inductively coupled plasma reactive ion etching of CoFeB magnetic thin films in a CH3COOH/Ar gas mixture

Vacuum ◽  
2015 ◽  
Vol 119 ◽  
pp. 151-158 ◽  
Author(s):  
Adrian Adalberto Garay ◽  
Su Min Hwang ◽  
Ji Hyun Choi ◽  
Byoung Chul Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Magnetic Thin Films ◽  
Gas Mixture ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Gas

Modification of the n-Surface Profile of AlGaInN LEDs by Changing the Gas-Mixture Composition During Reactive Ion Etching

2020 ◽  
Vol 54 (6) ◽  
pp. 672-676
Author(s):  
L. K. Markov ◽  
I. P. Smirnova ◽  
M. V. Kukushkin ◽  
A. S. Pavluchenko
Keyword(s):  
Reactive Ion Etching ◽  
Surface Profile ◽  
Mixture Composition ◽  
Gas Mixture ◽  
Ion Etching

Fabrication of GaN-based LEDs with 22° undercut sidewalls by inductively coupled plasma reactive ion etching

2013 ◽  
Vol 22 (10) ◽  
pp. 106802
Author(s):  
Bo Wang ◽  
Shi-Chen Su ◽  
Miao He ◽  
Hong Chen ◽  
Wen-Bo Wu ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

scholarly journals Inductively Coupled Plasma Reactive Ion Etching of AlGaAsSb and InGaAsSb for Quaternary Antimonide MIM Thermophotovoltaics

2002 ◽  
Author(s):  
M. N. Palmisiano ◽  
G. M. Peake ◽  
R. J. Shul ◽  
C. I. Ashby ◽  
J. G. Cederberg ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

Effect of the process parameters of inductively coupled plasma reactive ion etching on the fabrication of diamond nanotips

2014 ◽  
Vol 211 (10) ◽  
pp. 2343-2346 ◽  
Author(s):  
Hasan-al Mehedi ◽  
Vianney Mille ◽  
Jocelyn Achard ◽  
Ovidiu Brinza ◽  
Alix Gicquel
Keyword(s):  
Process Parameters ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled

Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma

2008 ◽  
Vol 103 (3) ◽  
pp. 034109 ◽  
Author(s):  
Z. Ren ◽  
P. J. Heard ◽  
J. M. Marshall ◽  
P. A. Thomas ◽  
S. Yu
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled
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