Effects of Low-Frequency Source on a Dual-Frequency Capacitive Sheath near a Concave Electrode

2014 ◽  
Vol 16 (4) ◽  
pp. 320-323
Author(s):  
Meilan Hao ◽  
Zhongling Dai ◽  
Younian Wang
2009 ◽  
Vol 23 (28) ◽  
pp. 3409-3417 ◽  
Author(s):  
GUOLI ZHAO ◽  
YONG XU ◽  
JIANPING SHANG ◽  
AIMIN ZHU ◽  
WENQI LU ◽  
...  

Radial non-uniformities of dual frequency capacitively coupled argon plasma were experimentally studied, using an optical emission spectroscopy probe, for different discharge pressures, discharge gaps, and frequencies and powers of the low frequency source. It was shown that the plasma emission profiles strongly depend on the working gas pressure and the lower frequency (LF) power. With the increasing LF power the emission profiles changed from a bell-shaped distribution at low LF power to a double-peak distribution at high LF power.


1994 ◽  
Vol 21 (3) ◽  
pp. 146-155
Author(s):  
Toshiaki NAKAMURA ◽  
Toshio TSUCHIYA ◽  
Iwao NAKANO ◽  
Toshiyuki NAKANISHI ◽  
Ieharu KAIHOU ◽  
...  

2017 ◽  
Vol 7 (3) ◽  
pp. 206-210 ◽  
Author(s):  
Bing Zhang ◽  
Linghao Cheng ◽  
Yizhi Liang ◽  
Long Jin ◽  
Tuan Guo ◽  
...  

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