Suppression of surface microstructure evolution in W and W–Ta alloys during simultaneous and sequential He and D ion irradiation in fusion relevant conditions

2017 ◽  
Vol 57 (8) ◽  
pp. 086001 ◽  
Author(s):  
S. Gonderman ◽  
J.K. Tripathi ◽  
T. Sizyuk ◽  
A. Hassanein
Author(s):  
Wentao Qin ◽  
Dorai Iyer ◽  
Jim Morgan ◽  
Carroll Casteel ◽  
Robert Watkins ◽  
...  

Abstract Ni(5 at.%Pt ) films were silicided at a temperature below 400 °C and at 550 °C. The two silicidation temperatures had produced different responses to the subsequent metal etch. Catastrophic removal of the silicide was seen with the low silicidation temperature, while the desired etch selectivity was achieved with the high silicidation temperature. The surface microstructures developed were characterized with TEM and Auger depth profiling. The data correlate with both silicidation temperatures and ultimately the difference in the response to the metal etch. With the high silicidation temperature, there existed a thin Si-oxide film that was close to the surface and embedded with particles which contain metals. This thin film is expected to contribute significantly to the desired etch selectivity. The formation of this layer is interpreted thermodynamically.


2021 ◽  
pp. 153460
Author(s):  
Yongqi Zhu ◽  
Zhoutong He ◽  
Huilei Ma ◽  
Fanggang Liu ◽  
Alex Theodosiou ◽  
...  

Wear ◽  
2020 ◽  
Vol 448-449 ◽  
pp. 203217 ◽  
Author(s):  
Yuda Chen ◽  
Ruiming Ren ◽  
Xiujuan Zhao ◽  
Chunhuan Chen ◽  
Rui Pan

2018 ◽  
Vol 228 ◽  
pp. 254-257 ◽  
Author(s):  
Boxin Wei ◽  
Yujin Wang ◽  
Haibin Zhang ◽  
Dong Wang ◽  
Shuming Peng ◽  
...  

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