Investigation of resistive switching in Ag/Ge/Si(001) stack by conductive atomic force microscopy
2021 ◽
Vol 2086
(1)
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pp. 012043
Keyword(s):
Abstract We report on an experimental study of resistive switching (RS) of individual dislocations in Ag/Ge/Si(001) memristors by combined grazing incidence ion sputtering of the Ag electrodes and application of Conductive Atomic Force Microscopy to provide an electrical contact to individual Ag-filled dislocations in the Ge layer. Two types of RS were observed corresponding to two different RS mechanisms: (i) drift of Ag+ ions inside the dislocation cores and (ii) RedOx reactions in residual GeO x in the etch pits on the Ge layer surface.
2015 ◽
Vol 44
(10)
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pp. 3395-3400
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2015 ◽
Vol 2015
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pp. 1-6
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2015 ◽
Vol 55
(11)
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pp. 2224-2228
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2017 ◽
Vol 05
(01)
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pp. 8-14
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