scholarly journals Analysis of chromatic aberrations influence on operation of the tunable AOTF-based source

2021 ◽  
Vol 2091 (1) ◽  
pp. 012012
Author(s):  
A S Beliaeva ◽  
G E Romanova ◽  
A N Chertov
Keyword(s):  
Luminous Flux ◽  
Tunable Filter ◽  
Spectral Studies ◽  
Essential Factor ◽  
Parallel Beam ◽  
Beam Path ◽  
Optimal Scheme ◽  
Color Coordinates ◽  
Color Standard ◽  
Chromatic Aberrations

Abstract Developing a source with the possibility of tuning in wavelengths based on an acousto-optical tunable filter (AOTF), an essential factor is the ability to provide accurate color coordinates of the simulated color (in the case of developing a color standard for colorimetry) or the required wavelength (in the case of an application for spectral studies). As shown earlier, the choice of the principal layout – confocal or parallel beam path - primarily determines the dimensions and efficiency of using the luminous flux. However, these schemes also need to be analyzed for color or wavelength fidelity, considering other components used in the scheme. The analysis performed allows to identify the optimal scheme to ensure the required color reproduction accuracy and establish the requirements for correcting chromatic aberrations of the components.

scholarly journals Chromatic aberrations correction for imaging spectrometer based on acousto-optic tunable filter with two transducers

2017 ◽  
Vol 25 (20) ◽  
pp. 23809 ◽  
Author(s):  
Huijie Zhao ◽  
Ziye Wang ◽  
Guorui Jia ◽  
Ying Zhang ◽  
Zefu Xu
Keyword(s):  
Tunable Filter ◽  
Imaging Spectrometer ◽  
Chromatic Aberrations

scholarly journals A Luminous Efficiency-Enhanced Laser Lighting Device with a Micro-Angle Tunable Filter to Recycle Unconverted Blue Laser Rays

Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1144
Author(s):  
Xinrui Ding ◽  
Ruixiang Qian ◽  
Liang Xu ◽  
Zongtao Li ◽  
Jiasheng Li ◽  
...  
Keyword(s):  
Heat Dissipation ◽  
High Energy ◽  
Luminous Flux ◽  
Tunable Filter ◽  
Blue Laser ◽  
High Energy Density ◽  
Color Temperature ◽  
Maximum Temperature ◽  
Lighting Device ◽  
Laser Rays

In this work, a phosphor converter with small thickness and low concentration, based on a micro-angle tunable tilted filter (ATFPC), was proposed for hybrid-type laser lighting devices to solve the problem of silicone phosphor converters’ carbonizing under high-energy density. Taking advantage of the filter and the scattering characteristics of microphosphors, two luminous areas are generated on the converter. Compared with conventional phosphor converters (CPCs), the lighting effects of ATFPCs are adjustable using tilt angles. When the tilt angle of the micro filter is 20°, the luminous flux of the ATPFCs is increased by 11.5% at the same concentration; the maximum temperature (MT) of ATFPCs is reduced by 22.8% under the same luminous flux and the same correlated color temperature (CCT) 6500 K. This new type of lighting device provides an alternative way to improve the luminous flux and heat dissipation of laser lighting.

The Reduction of Chromatic Aberrations Due to Instrumental Instabilities

1971 ◽  
Vol 29 ◽  
pp. 14-15
Author(s):  
J. S. Lally ◽  
R. Evans
Keyword(s):  
Electron Microscope ◽  
High Voltage ◽  
Focal Length ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Usual Practice ◽  
Voltage Electron ◽  
Short Focal Length ◽  
Chromatic Aberrations ◽  
Electron Microscopes

One of the instrumental factors often limiting the resolution of the electron microscope is image defocussing due to changes in accelerating voltage or objective lens current. This factor is particularly important in high voltage electron microscopes both because of the higher voltages and lens currents required but also because of the inherently longer focal lengths, i.e. 6 mm in contrast to 1.5-2.2 mm for modern short focal length objectives.The usual practice in commercial electron microscopes is to design separately stabilized accelerating voltage and lens supplies. In this case chromatic aberration in the image is caused by the random and independent fluctuations of both the high voltage and objective lens current.

Improvements in the electron probe forming capabilities and x-ray hole counts in the Philips TEM

1983 ◽  
Vol 41 ◽  
pp. 376-377
Author(s):  
Richard L. McConville
Keyword(s):  
Field Strength ◽  
Electron Probe ◽  
Spherical Aberration ◽  
Focal Length ◽  
Objective Lens ◽  
Parallel Beam ◽  
Tilt Axis ◽  
X Ray ◽  
Small Probe ◽  
Specimen Height

A second generation twin lens has been developed. This symmetrical lens with a wider bore, yet superior values of chromatic and spherical aberration for a given focal length, retains both eucentric ± 60° tilt movement and 20°x ray detector take-off angle at 90° to the tilt axis. Adjust able tilt axis height, as well as specimen height, now ensures almost invariant objective lens strengths for both TEM (parallel beam conditions) and STEM or nano probe (focused small probe) modes.These modes are selected through use of an auxiliary lens situ ated above the objective. When this lens is on the specimen is illuminated with a parallel beam of electrons, and when it is off the specimen is illuminated with a focused probe of dimensions governed by the excitation of the condenser 1 lens. Thus TEM/STEM operation is controlled by a lens which is independent of the objective lens field strength.

New Aspects in the Design of Electron Optical Magnification Systems

1972 ◽  
Vol 30 ◽  
pp. 606-607
Author(s):  
Willem H.J. Andersen
Keyword(s):  
Electron Microscope ◽  
Imaging System ◽  
Chromatic Aberration ◽  
Research Tool ◽  
Energy Losses ◽  
Objective Lens ◽  
Theoretical Limit ◽  
Optical Magnification ◽  
Chromatic Aberrations ◽  
High Degree

Electron microscope design, and particularly the design of the imaging system, has reached a high degree of perfection. Present objective lenses perform up to their theoretical limit, while the whole imaging system, consisting of three or four lenses, provides very wide ranges of magnification and diffraction camera length with virtually no distortion of the image. Evolution of the electron microscope in to a routine research tool in which objects of steadily increasing thickness are investigated, has made it necessary for the designer to pay special attention to the chromatic aberrations of the magnification system (as distinct from the chromatic aberration of the objective lens). These chromatic aberrations cause edge un-sharpness of the image due to electrons which have suffered energy losses in the object.There exist two kinds of chromatic aberration of the magnification system; the chromatic change of magnification, characterized by the coefficient Cm, and the chromatic change of rotation given by Cp.

100 KV Scanning Microscope

1972 ◽  
Vol 30 ◽  
pp. 472-473 ◽  
Author(s):  
A. V. Crewe ◽  
M. W. Retsky
Keyword(s):  
High Voltage ◽  
Voltage Divider ◽  
Electron Gun ◽  
Objective Lens ◽  
Parallel Beam ◽  
Emission Point ◽  
Error Amplifier ◽  
External Reference ◽  
Scanning Transmission ◽  
Transmission Microscope

A 100 kv scanning transmission microscope has been built. Briefly, the design is as follows: The electron gun consists of a field emission point and a 3 cm Butler gun. The beam has a crossover outside the gun and is collimated by a condenser lens.The parallel beam passes through a defining aperture and is focused by the objective lens onto the specimen. The elastic electrons are detected by two annular detectors, each subtending a different angle, and the unscattered and inelastic electrons are collected by a third detector. The spectrometer that will separate the inelastic and unscattered electrons has not yet been built.The lens current supplies are stable to within one part per million per hour and have been described elsewhere.The high voltage is also stable to 1 ppm/hr. It consists of the raw supply from a 100 kv Spellman power supply controlled by an external reference voltage, high voltage divider, and error amplifier.

Identification by Electron Microdiffraction of Intermetallic Phases in a Duplex Stainless Steel

1990 ◽  
Vol 48 (2) ◽  
pp. 494-495
Author(s):  
A. Redjaïmia ◽  
J.P. Morniroli ◽  
G. Metauer ◽  
M. Gantois
Keyword(s):  
Stainless Steel ◽  
Duplex Stainless Steel ◽  
Convergent Beam Electron Diffraction ◽  
Intermetallic Phases ◽  
Small Particles ◽  
Parallel Beam ◽  
Diffraction Patterns ◽  
Average Size ◽  
Convergent Beam ◽  
Electron Microdiffraction

2D and especially 3D symmetry information required to determine the crystal structure of four intermetallic phases present as small particles (average size in the range 100-500nm) in a Fe.22Cr.5Ni.3Mo.0.03C duplex stainless steel is not present in most Convergent Beam Electron Diffraction (CBED) patterns. Nevertheless it is possible to deduce many crystal features and to identify unambiguously these four phases by means of microdiffraction patterns obtained with a nearly parallel beam focused on a very small area (50-100nm).From examinations of the whole pattern reduced (RS) and full (FS) symmetries the 7 crystal systems and the 11 Laue classes are distinguished without ambiguity (1). By considering the shifts and the periodicity differences between the ZOLZ and FOLZ reflection nets on specific Zone Axis Patterns (ZAP) which depend on the crystal system, the centering type of the cell and the glide planes are simultaneously identified (2). This identification is easily done by comparisons with the corresponding simulated diffraction patterns.

Examination of Extra Electron Diffraction Spots Observed in Deuterium-Irradiated Silicon by Using Parallel Electron Beam Illumination

1990 ◽  
Vol 48 (2) ◽  
pp. 490-491
Author(s):  
Ryuichiro Oshima ◽  
Shoichiro Honda ◽  
Tetsuo Tanabe
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Silicon Single Crystal ◽  
Mixed Solution ◽  
Parallel Beam ◽  
Defect Clusters ◽  
Float Zone ◽  
Transmission Electron ◽  
Extra Electron ◽  
Diffraction Patterns

In order to examine the origin of extra diffraction spots and streaks observed in selected area diffraction patterns of deuterium irradiated silicon, systematic diffraction experiments have been carried out by using parallel beam illumination.Disc specimens 3mm in diameter and 0.5mm thick were prepared from a float zone silicon single crystal(B doped, 7kΩm), and were chemically thinned in a mixed solution of nitric acid and hydrogen fluoride to make a small hole at the center for transmission electron microscopy. The pre-thinned samples were irradiated with deuterium ions at temperatures between 300-673K at 20keV to a dose of 1022ions/m2, and induced lattice defects were examined under a JEOL 200CX electron microscope operated at 160kV.No indication of formation of amorphous was obtained in the present experiments. Figure 1 shows an example of defects induced by irradiation at 300K with a dose of 2xl021ions/m2. A large number of defect clusters are seen in the micrograph.

Toward The Simultaneous Correction of Spherical and Chromatic Aberration in Electron Optics by Means of an Electrostatic Electron Mirror

1990 ◽  
Vol 48 (1) ◽  
pp. 206-207
Author(s):  
Gertrude. F. Rempfer
Keyword(s):  
Chromatic Aberration ◽  
Transverse Magnetic ◽  
Objective Lens ◽  
Ion Imaging ◽  
Corrected Image ◽  
Electric And Magnetic Fields ◽  
Chromatic Aberrations ◽  
Improved Performance ◽  
Electron Microscopes ◽  
Image Planes

Optimum performance in electron and ion imaging instruments, such as electron microscopes and probe-forming instruments, in most cases depends on a compromise either between imaging errors due to spherical and chromatic aberrations and the diffraction error or between the imaging errors and the current in the image. These compromises result in the use of very small angular apertures. Reducing the spherical and chromatic aberration coefficients would permit the use of larger apertures with resulting improved performance, granted that other problems such as incorrect operation of the instrument or spurious disturbances do not interfere. One approach to correcting aberrations which has been investigated extensively is through the use of multipole electric and magnetic fields. Another approach involves the use of foil windows. However, a practical system for correcting spherical and chromatic aberration is not yet available.Our approach to correction of spherical and chromatic aberration makes use of an electrostatic electron mirror. Early studies of the properties of electron mirrors were done by Recknagel. More recently my colleagues and I have studied the properties of the hyperbolic electron mirror as a function of the ratio of accelerating voltage to mirror voltage. The spherical and chromatic aberration coefficients of the mirror are of opposite sign (overcorrected) from those of electron lenses (undercorrected). This important property invites one to find a way to incorporate a correcting mirror in an electron microscope. Unfortunately, the parts of the beam heading toward and away from the mirror must be separated. A transverse magnetic field can separate the beams, but in general the deflection aberrations degrade the image. The key to avoiding the detrimental effects of deflection aberrations is to have deflections take place at image planes. Our separating system is shown in Fig. 1. Deflections take place at the separating magnet and also at two additional magnetic deflectors. The uncorrected magnified image formed by the objective lens is focused in the first deflector, and relay lenses transfer the image to the separating magnet. The interface lens and the hyperbolic mirror acting in zoom fashion return the corrected image to the separating magnet, and the second set of relay lenses transfers the image to the final deflector, where the beam is deflected onto the projection axis.

Sign in / Sign up

Export Citation Format

Share Document