scholarly journals Creation of micro-and nanochannels on the surface of silicon chips by lithography methods and investigation of ion transport in channel

2021 ◽  
Vol 2103 (1) ◽  
pp. 012112
Author(s):  
Polina Afonicheva ◽  
Denis Lebedev ◽  
Anton Bukatin ◽  
Ivan Mukhin ◽  
Anatoly Evstrapov
Keyword(s):  
Ion Transport ◽  
Optical Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Optical Lithography ◽  
Ion Conductivity ◽  
Diffusion Flow ◽  
Genetic Studies ◽  
Silicon Chips ◽  
Flow Through

Abstract We developed a technique for fabrication microfluidic silicon-glass chips with a system of nanochannels connecting two microchannel using traditional optical lithography and a focused ion beam. To investigate the transport phenomena in the nanochannels we experimentally studied their ion conductivity and using optical microscopy confirmed the existence of the diffusion flow through them. The developed method allows us to create systems of nanochannels with on-purpose geometry and controlled sizes. Devices with such nanochannels can be applied in the creation of biosensor devices and for genetic studies.

In Vivo Biostability of CVD Silicon Oxide and Silicon Nitride Films

2005 ◽  
Vol 872 ◽  
Author(s):  
John M. Maloney ◽  
Sara A. Lipka ◽  
Samuel P. Baldwin
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Silicon Oxide ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Silicon Chips ◽  
Silicon Nitride Films

AbstractLow pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD) silicon oxide and silicon nitride films were implanted subcutaneously in a rat model to study in vivo behavior of the films. Silicon chips coated with the films of interest were implanted for up to one year, and film thickness was evaluated by spectrophotometry and sectioning. Dissolution rates were estimated to be 0.33 nm/day for LPCVD silicon nitride, 2.0 nm/day for PECVD silicon nitride, and 3.5 nm/day for PECVD silicon oxide. A similar PECVD silicon oxide dissolution rate was observed on a silicon oxide / silicon nitride / silicon oxide stack that was sectioned by focused ion beam etching. These results provide a biostability reference for designing implantable microfabricated devices that feature exposed ceramic films.

Fabrication of silicon aperture probes for scanning near-field optical microscopy by focused ion beam nano machining

2001 ◽  
Vol 57-58 ◽  
pp. 721-728 ◽  
Author(s):  
C. Lehrer ◽  
L. Frey ◽  
S. Petersen ◽  
Th. Sulzbach ◽  
O. Ohlsson ◽  
...  
Keyword(s):  
Optical Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Near Field

scholarly journals Fabrication of probes for scanning near-field optical microscopy using focused ion beam

2018 ◽  
Vol 443 ◽  
pp. 012015 ◽  
Author(s):  
A S Kolomiytsev ◽  
N A Shandyba ◽  
I V Panchenko ◽  
S A Lisitsyn
Keyword(s):  
Optical Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Near Field

Magneto-optical microscopy as a favourite tool to probe focused ion beam patterning at low dose

2006 ◽  
Vol 17 (13) ◽  
pp. 3308-3312 ◽  
Author(s):  
A Ruotolo ◽  
S Wiebel ◽  
J P Jamet ◽  
N Vernier ◽  
D Pullini ◽  
...  
Keyword(s):  
Optical Microscopy ◽  
Focused Ion Beam ◽  
Low Dose ◽  
Ion Beam ◽  
Ion Beam Patterning

High definition aperture probes for near-field optical microscopy fabricated by focused ion beam milling

1998 ◽  
Vol 72 (24) ◽  
pp. 3115-3117 ◽  
Author(s):  
J. A. Veerman ◽  
A. M. Otter ◽  
L. Kuipers ◽  
N. F. van Hulst
Keyword(s):  
Optical Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Near Field ◽  
High Definition ◽  
Focused Ion Beam Milling
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