Optical Emission Spectroscopy Study of the Electron Temperature and Electron Density Dependence on the Pressure Chamber for the Carbon Deposition Produced by Argon Plasma Sputtering

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.

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Optical Emission Spectroscopy of Argon Plasma Jet

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.770.245 ◽

2013 ◽

Vol 770 ◽

pp. 245-248 ◽

Cited By ~ 1

Author(s):

Kanchaya Honglertkongsakul

Keyword(s):

Electron Temperature ◽

Nozzle Exit ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Argon Plasma ◽

Optical Emission ◽

Plasma Jet ◽

Plasma Expansion ◽

Plasma Parameters ◽

Argon Plasma Jet

Argon plasma jet in a single-electrode configuration was generated at low temperature and atmospheric pressure by 50 kHz radiofrequency power supply. Optical Emission Spectroscopy (OES) was used to investigate the local emissivity of argon plasma in the range between 200 and 1,100 nm. The spatial distribution of reactive species was measured at different distances of the plasma expansion from the nozzle exit such as 0.0, 0.5, 1.0, 1.5, 2.0, 2.5 and 3.0 cm. These measurements were obtained to analyze the plasma parameters such as electron temperature and electron density. The effect of distances of the plasma expansion from the nozzle exit on the plasma parameters was studied. The main intensive argon lines were found in the region between 690 and 970 nm. The electron temperature was found in the range of 0.5-1.1 eV. The electron density was found in the range of 4.0x1012-1.2x1013 cm-3. The plasma parameters strongly depended on the distances of the plasma expansion from the nozzle exit.

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Optical Emission Spectroscopy of Magnethron Discharge Ar/Cu Plasma

Plasma Physics and Technology Journal ◽

10.14311/ppt.2019.1.87 ◽

2019 ◽

Vol 6 (1) ◽

pp. 87-90

Author(s):

A. Murmantsev ◽

A. Veklich ◽

V. Boretskij ◽

A. Shapovalov ◽

A. Kalenyuk

Keyword(s):

Electron Density ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Argon Plasma ◽

Optical Emission ◽

Excitation Temperature ◽

Plasma Parameters ◽

Magnetron Discharge ◽

Deposition Processes ◽

Switching Devices

Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is studied by optical emission spectroscopy. Such discharges are usually used as effective sources in sputtering or deposition processes. Vapor admixtures in argon plasma define mainly the temperature and electron density in such discharges. This is the feature, which is typically takes place in plasma of discharge between contacts/electrodes in switching devices of electric technology circuits.

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OPTICAL EMISSION SPECTROSCOPY OF CARBON ARC DISCHARGE PLASMA

Jurnal Teknologi ◽

10.11113/jt.v74.4735 ◽

2015 ◽

Vol 74 (8) ◽

Cited By ~ 1

Author(s):

Kashif Chaudhary ◽

Usman Tariq ◽

Sufi Roslan ◽

Ong Shude ◽

M. S. Aziz

Keyword(s):

Electron Temperature ◽

Electron Density ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Discharge Plasma ◽

Arc Discharge ◽

Ambient Pressure ◽

Optical Emission ◽

Plasma Dynamics ◽

Arc Current

The arc discharge plasma is one of the efficient technique to fabricate nano-structures such as nanotubes, nanoparticles and thin films, which have variety of technological applications. In this study, plasma dynamics such as the electron density and temperature for arc discharge carbon plasma in methane ambient environment is presented to investigate the impact and contribution of physical parameter as arc current and ambient pressure on the plasma dynamics. The electron temperature and density is estimated applying in situ optical emission spectroscopy. The optical spectra are recorded for applied arc current 50A, 60A, 70A, 80A and 90A for ambient pressures 100torr, 300torr and 500torr. A rise in electron temperature and electron density is detected with increase in applied arc current and ambient pressure. The obtained results reveal that in arc discharge process, the arc current and ambient pressure have significant contribution towards the kinetics of the plasma species.

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