Optical Emission Spectroscopy and Contact Angle Study of Plasma Cleaning of Titanium Alloy Surfaces: Argon Plasma

2015 ◽  
Vol 5 (2-4) ◽  
pp. 223-236 ◽  
Author(s):  
Jordan Katz ◽  
Sophia Gershman ◽  
Abraham Belkind
Keyword(s):  
Contact Angle ◽  
Titanium Alloy ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Plasma Cleaning

Characterization of a low-pressure argon plasma using optical emission spectroscopy and a global model

2007 ◽  
Vol 101 (5) ◽  
pp. 053306 ◽  
Author(s):  
A. Palmero ◽  
E. D. van Hattum ◽  
H. Rudolph ◽  
F. H. P. M. Habraken
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Low Pressure ◽  
Global Model

Optical Emission Spectroscopy of Argon Plasma Jet

2013 ◽  
Vol 770 ◽  
pp. 245-248 ◽  
Author(s):  
Kanchaya Honglertkongsakul
Keyword(s):  
Electron Temperature ◽  
Nozzle Exit ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Plasma Jet ◽  
Plasma Expansion ◽  
Plasma Parameters ◽  
Argon Plasma Jet

Argon plasma jet in a single-electrode configuration was generated at low temperature and atmospheric pressure by 50 kHz radiofrequency power supply. Optical Emission Spectroscopy (OES) was used to investigate the local emissivity of argon plasma in the range between 200 and 1,100 nm. The spatial distribution of reactive species was measured at different distances of the plasma expansion from the nozzle exit such as 0.0, 0.5, 1.0, 1.5, 2.0, 2.5 and 3.0 cm. These measurements were obtained to analyze the plasma parameters such as electron temperature and electron density. The effect of distances of the plasma expansion from the nozzle exit on the plasma parameters was studied. The main intensive argon lines were found in the region between 690 and 970 nm. The electron temperature was found in the range of 0.5-1.1 eV. The electron density was found in the range of 4.0x1012-1.2x1013 cm-3. The plasma parameters strongly depended on the distances of the plasma expansion from the nozzle exit.

Polymerization of Maleic Anhydride Induced by Non-Equilibrium Atmospheric Pressure Argon Plasma

2014 ◽  
Vol 670-671 ◽  
pp. 244-248 ◽  
Author(s):  
Jun Yan ◽  
Katsuhiko Hosoi ◽  
Shin-ichi Kuroda
Keyword(s):  
Maleic Anhydride ◽  
Atmospheric Pressure ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Plasma Jet ◽  
Ft Ir ◽  
Deposited Films ◽  
Non Equilibrium

The non-equilibrium atmospheric pressure Ar plasma was applied for the polymerization of maleic anhydride (MA). The deposited films were analyzed by using Fourier transform infrared spectroscopy (FT-IR) proving the monomer was successfully polymerized with retaining the functional groups. The intensity of optical emission spectroscopy (OES) of the plasma jet was found to become weaker when the monomer was introduced into the jet. This was interpreted as the result of the energy transfer from the metastable Ar to the monomer. It was proposed that the excited MA changed into π-π* transition state to produce dimer biradicals which initiate the polymerization.

scholarly journals Optical Emission Spectroscopy of Magnethron Discharge Ar/Cu Plasma

2019 ◽  
Vol 6 (1) ◽  
pp. 87-90
Author(s):  
A. Murmantsev ◽  
A. Veklich ◽  
V. Boretskij ◽  
A. Shapovalov ◽  
A. Kalenyuk
Keyword(s):  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Excitation Temperature ◽  
Plasma Parameters ◽  
Magnetron Discharge ◽  
Deposition Processes ◽  
Switching Devices

Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is studied by optical emission spectroscopy. Such discharges are usually used as effective sources in sputtering or deposition processes. Vapor admixtures in argon plasma define mainly the temperature and electron density in such discharges. This is the feature, which is typically takes place in plasma of discharge between contacts/electrodes in switching devices of electric technology circuits.

scholarly journals Characterization of an Atmospheric-Pressure Argon Plasma Generated by 915 MHz Microwaves Using Optical Emission Spectroscopy

2017 ◽  
Vol 2017 ◽  
pp. 1-6
Author(s):  
Robert Miotk ◽  
Bartosz Hrycak ◽  
Mariusz Jasiński ◽  
Jerzy Mizeraczyk
Keyword(s):  
Atmospheric Pressure ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Microwave Plasma ◽  
Argon Plasma ◽  
Optical Emission ◽  
Coaxial Line ◽  
Plasma Source ◽  
Stark Broadening ◽  
Concentration Of Electrons

The paper presents the investigations of an atmospheric-pressure argon plasma generated at 915 MHz microwaves using the optical emission spectroscopy (OES). The 915 MHz microwave plasma was inducted and sustained in a waveguide-supplied coaxial-line-based nozzleless microwave plasma source. The aim of presented investigations was to estimate parameters of the generated plasma, that is, excitation temperature of electrons Texc, temperature of plasma gas Tg, and concentration of electrons ne. Assuming that excited levels of argon atoms are in local thermodynamic equilibrium, Boltzmann method allowed in determining the Texc temperature in the range of 8100–11000 K. The temperature of plasma gas Tg was estimated by comparing the simulated spectra of the OH radical to the measured one in LIFBASE program. The obtained Tg temperature ranged in 1200–2800 K. Using a method based on Stark broadening of the Hβ line, the concentration of electrons ne was determined in the range from 1.4 × 1015 to 1.7 × 1015 cm−3, depending on the power absorbed by the microwave plasma.

Sign in / Sign up

Export Citation Format

Share Document