Energy-density and repetition-rate dependences of the KrF-excimer-laser-induced 1.9-eV emission band in type-III fused silicas

1993 ◽  
Vol 47 (6) ◽  
pp. 3078-3082 ◽  
Author(s):  
Nobu Kuzuu ◽  
Yoshikazu Komatsu ◽  
Masataka Murahara
Keyword(s):  
Energy Density ◽  
Excimer Laser ◽  
Repetition Rate ◽  
Emission Band ◽  
Type Iii ◽  
Krf Excimer Laser

Micropatterning of BiSrCaCuO Thin Films Using Excimer Laser

1998 ◽  
Vol 12 (32) ◽  
pp. 3485-3494 ◽  
Author(s):  
S. Higo ◽  
Y. Hakuraku ◽  
Y. Shimada ◽  
E. Minamizono ◽  
M. Tadokoro ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Density ◽  
Excimer Laser ◽  
Superconducting Thin Films ◽  
Superconducting Properties ◽  
Laser Patterning ◽  
Atomic Force ◽  
Optimum Energy ◽  
Patterning Technique ◽  
Krf Excimer Laser

Micropatterning of BiSrCaCuO(BSCCO) superconducting thin films has been successfully accomplished by using a pulsed KrF excimer laser with a wavelength of λ=248 nm and a duration of 25 ns. The optimum energy density of the laser was 0.36 Jcm -2 for etching of these films. For example, a superconducting microstructure of BSCCO film with nominally 3 μm wide and 2 μm long, showed no degradation in T c and J c . Excimer laser patterning technique yields reproducible patterning without any degradation of superconducting properties. The etching bordering and surface morphology was examined using an atomic force microscope.

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