Nonlocality in spherical-aberration-corrected HAADF STEM images

2013 ◽  
Vol 69 (3) ◽  
pp. 289-296 ◽  
Author(s):  
Masahiro Ohtsuka ◽  
Takashi Yamazaki ◽  
Yasutoshi Kotaka ◽  
Hironori Fujisawa ◽  
Masaru Shimizu ◽  
...  
2009 ◽  
Vol 110 (1) ◽  
pp. 36-42 ◽  
Author(s):  
Koji Kuramochi ◽  
Takashi Yamazaki ◽  
Yasutoshi Kotaka ◽  
Masahiro Ohtsuka ◽  
Iwao Hashimoto ◽  
...  

2010 ◽  
Vol 91 (3) ◽  
pp. 36001 ◽  
Author(s):  
M. J. Casanove ◽  
N. Combe ◽  
F. Houdellier ◽  
M. J. Hÿtch

2012 ◽  
Vol 54 (3) ◽  
pp. 159-165
Author(s):  
Yoshifumi OSHIMA ◽  
Yasumasa TANISHIRO ◽  
Takayuki TANAKA ◽  
Kunio TAKAYANAGI

2008 ◽  
Vol 14 (1) ◽  
pp. 2-15 ◽  
Author(s):  
David J. Smith

The successful correction of spherical aberration is an exciting and revolutionary development for the whole field of electron microscopy. Image interpretability can be extended out to sub-Ångstrom levels, thereby creating many novel opportunities for materials characterization. Correction of lens aberrations involves either direct (online) hardware attachments in fixed-beam or scanning TEM or indirect (off-line) software processing using either off-axis electron holography or focal-series reconstruction. This review traces some of the important steps along the path to realizing aberration correction, including early attempts with hardware correctors, the development of online microscope control, and methods for accurate measurement of aberrations. Recent developments and some initial applications of aberration-corrected electron microscopy using these different approaches are surveyed. Finally, future prospects and problems are briefly discussed.


2009 ◽  
Vol 34 (2) ◽  
pp. 297-300
Author(s):  
Shin Inamoto ◽  
Jun Yamasaki ◽  
Eiji Okunishi ◽  
Kuniyuki Kakushima ◽  
Hiroshi Iwai ◽  
...  

2000 ◽  
Vol 6 (S2) ◽  
pp. 746-747 ◽  
Author(s):  
D.J. Maas ◽  
A. Henstra ◽  
M.P.C.M. Krijn ◽  
S.A.M. Mentink

The resolution of a low-voltage electron microscope is limited by the chromatic and spherical aberration of the objective lens, see Fig. 1. The design of state-of-the-art objective lenses is optimised for minimal aberrations. Any significant improvement of the resolution requires an aberration corrector. Recently, correction of both Cc and Cs has been demonstrated in SEM, using a combination of magnetic and electrostatic quadrupoles and octupoles (Zach and Haider, 1995). The present paper presents an alternative design, which is based on a purely electrostatic concept, potentially simplifying the ease-of-use of an aberration corrected microscope.In 1936 Scherzer showed that the fundamental lens aberrations of round lenses are positive definite, in absence of time-varying fields and/or space charge. Negative lens aberrations, required for the correction of Cc and Cs, can only be obtained using non-round lenses, e.g. quadrupoles and octupoles (Scherzer, 1947).


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