Heat flow analysis for EOS/ESD protection device design in SOI technology

1997 ◽  
Vol 44 (3) ◽  
pp. 464-471 ◽  
Author(s):  
P. Raha ◽  
S. Ramaswamy ◽  
E. Rosenbaum
2014 ◽  
Vol 687-691 ◽  
pp. 3251-3254
Author(s):  
Zhuo Tian ◽  
Bai Cheng Li

ComparedtobulkCMOStechnology,Silicon-on-Insulator (SOI) CMOS technology has many advantages, such as low power consumption, low leakage current, low parasitic capacitance and a low soft error rate from both alpha particles and cosmic rays. However,electrostatic discharge (ESD) protection in SOI technology is still a major substantial barrier to overcome for the poor thermal conductivity of isolation oxide and the absence of vertical diode and silicon controlled rectifier (SCR).


1998 ◽  
Vol 38 (11) ◽  
pp. 1723-1731 ◽  
Author(s):  
P. Raha ◽  
J.C. Smith ◽  
J.W. Miller ◽  
E. Rosenbaum

2002 ◽  
Vol 46 (12) ◽  
pp. 2117-2122 ◽  
Author(s):  
N Shigyo ◽  
H Kawashima ◽  
S Yasuda

Sign in / Sign up

Export Citation Format

Share Document