Radical and electron densities in a high plasma density-chemical vapor deposition reactor from a three-dimensional simulation

IEEE Transactions on Plasma Science ◽

10.1109/27.763037 ◽

1999 ◽

Vol 27 (1) ◽

pp. 62-63 ◽

Author(s):

E.R. Keiter ◽

M.J. Kushner

Keyword(s):

Chemical Vapor Deposition ◽

Plasma Density ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

High Plasma ◽

Electron Densities ◽

Chemical Vapor Deposition Reactor ◽

High Plasma Density ◽

Dimensional Simulation

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Heat and mass transfer characteristics of three-dimensional bell-shaped polysilicon chemical vapor deposition reactor

Journal of Thermal Analysis and Calorimetry ◽

10.1007/s10973-020-09465-6 ◽

2020 ◽

Vol 141 (1) ◽

pp. 323-335

Author(s):

Lisha An ◽

Xiangshu Lei ◽

Xin Qi ◽

Ming Fang ◽

Yingwen Liu

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Transfer Characteristics

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CHARACTERISTICS OF THREE-DIMENSIONAL FLOW, HEAT, AND MASS TRANSFER IN A CHEMICAL VAPOR DEPOSITION REACTOR

Numerical Heat Transfer Part A Applications ◽

10.1080/104077800274253 ◽

2000 ◽

Vol 37 (4) ◽

pp. 407-423 ◽

Author(s):

Kyoung-Woo Park, Hi-Yong Pak

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Three Dimensional Flow ◽

Chemical Vapor Deposition Reactor ◽

Dimensional Flow ◽

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Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2006.05.049 ◽

2006 ◽

Vol 293 (2) ◽

pp. 475-484 ◽

Author(s):

T.S. Cheng ◽

M.C. Hsiao

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Three Dimensional Flow ◽

Chemical Vapor Deposition Reactor ◽

Thermal Fields ◽

Dimensional Flow

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Three-Dimensional Mixed Convection in a Horizontal Chemical Vapor Deposition Reactor

Journal of Heat Transfer ◽

10.1115/1.2910760 ◽

1993 ◽

Vol 115 (3) ◽

pp. 803-806 ◽

Author(s):

K. C. Karki ◽

P. S. Sathyamurthy ◽

S. V. Patankar

Keyword(s):

Chemical Vapor Deposition ◽

Mixed Convection ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

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Numerical Study of a Three-Dimensional Chemical Vapor Deposition Reactor with Detailed Chemistry

Journal of Computational Physics ◽

10.1006/jcph.1996.0117 ◽

1996 ◽

Vol 126 (1) ◽

pp. 21-39 ◽

Author(s):

Alexandre Ern ◽

Vincent Giovangigli ◽

Mitchell D. Smooke

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Numerical Study ◽

Three Dimensional ◽

Chemical Vapor ◽

Detailed Chemistry ◽

Chemical Vapor Deposition Reactor

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Two-dimensional simulation of a hot-filament chemical vapor deposition reactor

Diamond and Related Materials ◽

10.1016/0925-9635(95)00493-9 ◽

1996 ◽

Vol 5 (9) ◽

pp. 888-894 ◽

Author(s):

Y.A. Mankelevich ◽

A.T. Rakhimov ◽

N.V. Suetin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Two Dimensional ◽

Chemical Vapor Deposition Reactor ◽

Dimensional Simulation ◽

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Three-dimensional simulation of the conformality of copper layers deposited by low-pressure chemical vapor deposition from CuI(tmvs)(hfac)

Microelectronic Engineering ◽

10.1016/s0167-9317(99)00318-4 ◽

2000 ◽

Vol 50 (1-4) ◽

pp. 481-486 ◽

Author(s):

E Bär ◽

J Lorenz ◽

H Ryssel

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical ◽

Dimensional Simulation

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Two- and three-dimensional simulation of chemical vapor deposition SiC epitaxial growth processes

Journal of Electronic Materials ◽

10.1007/s11664-003-0176-1 ◽

2003 ◽

Vol 32 (5) ◽

pp. 448-451 ◽

Author(s):

Y. Koshka ◽

G. Melnychuk ◽

M. S. Mazzola

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Growth Processes ◽

Dimensional Simulation

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The PROMPT project and its application to the three-dimensional simulation of low-pressure chemical vapor deposition processes

Solid-State Electronics ◽

10.1016/s0038-1101(97)00003-8 ◽

1997 ◽

Vol 41 (7) ◽

pp. 939-943

Author(s):

E Bär ◽

J Lorenz

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical ◽

Deposition Processes ◽

Dimensional Simulation

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Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Materials Science Forum ◽

10.4028/www.scientific.net/msf.514-516.475 ◽

2006 ◽

Vol 514-516 ◽

pp. 475-482 ◽

Author(s):

Pedro Alpuim ◽

M. Ribeiro ◽

Sergej Filonovich

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Flexible Substrates ◽

Hot Wire ◽

Chemical Vapor Deposition Reactor ◽

Deposition Parameters ◽

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