Improvement in dark current characteristics and long-term stability of mesa InGaAs/InP p-i-n photodiodes with two-step SiN/sub x/ surface passivation

1991 ◽  
Vol 3 (10) ◽  
pp. 934-936 ◽  
Author(s):  
R.-T. Huang ◽  
D. Renner
2017 ◽  
Vol 7 (5) ◽  
pp. 1197-1202 ◽  
Author(s):  
Tim Niewelt ◽  
Wolfram Kwapil ◽  
Marisa Selinger ◽  
Armin Richter ◽  
Martin C. Schubert

1997 ◽  
Vol 477 ◽  
Author(s):  
S. A. Tabatabaei ◽  
G. A. Porkolab ◽  
S. Agarwala ◽  
F. G. Johnson ◽  
S. A. Merritt ◽  
...  

ABSTRACTThis paper describes in detail a surface preparation, and post-etch removal technique developed for InGaAs sidewalls. It illustrates the results demonstrating the effect of sidewall post-etch, surface preparation, and surface passivation on the performance of high speed InGaAs detectors. Dark current density for circular diodes with a diameter size varying between 10 and 100 μm was measured at a reverse bias voltage of −5 V. The effectiveness of various surface preparation techniques was studied by measuring the immediate improvement in dark current density, as well as its long-term stability. The benefits of this new technique compared to other techniques we have investigated include improved device characteristics, long-term stability, as well as a much less critical process to achieve optimum surface properties.


2017 ◽  
Vol 412 ◽  
pp. 657-667 ◽  
Author(s):  
Ruy S. Bonilla ◽  
Christian Reichel ◽  
Martin Hermle ◽  
Phillip Hamer ◽  
Peter R. Wilshaw

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