Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency Spread

Author(s):  
Gowtham Peringattu Kalarikkal ◽  
Rohit Goel ◽  
Hitesh Shrimali
Keyword(s):  
Author(s):  
Stephan Kleindiek ◽  
Matthias Kemmler ◽  
Andreas Rummel ◽  
Klaus Schock

Abstract Using a compact nanoprobing setup comprising eight probe tips attached to piezo-driven micromanipulators, various techniques for fault isolation are performed on 28 nm samples inside an SEM. The recently implemented Current Imaging technique is used to quickly image large arrays of contacts providing a means of locating faults.


2014 ◽  
Vol 9 (9th) ◽  
pp. 1-12
Author(s):  
Mostafa Hosny ◽  
Sameh Ibrahim ◽  
DiaaEldin Khalil ◽  
Mohamed Dessouky

Author(s):  
David del Rio ◽  
Chia-Jen Liang ◽  
Ching-Wen Chiang ◽  
Roc Berenguer ◽  
Mau-Chung Frank Chang ◽  
...  
Keyword(s):  
60 Ghz ◽  

2014 ◽  
Vol 42 (12) ◽  
pp. 3712-3715 ◽  
Author(s):  
Shea-Jue Wang ◽  
Mu-Chun Wang ◽  
Win-Der Lee ◽  
Jie-Min Yang ◽  
L. S. Huang ◽  
...  

Author(s):  
Shuting Shi ◽  
Rui Chen ◽  
Rui Liu ◽  
Mo Chen ◽  
Chen Shen ◽  
...  

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