Use of a 90° phase shift detector and sampled-data loop filter in PLL

AbstractIn order to increase the efficiency of dedicated frequency channels, i.e. to increase the specific data transfer rate, multipositional quadrature phase shift keying (QPSK, aka 4-PSK) should be used. The problems with QPSK signal demodulation is a rotation of the signal constellation plane by an angle multiple of 90° and a slow response of the carrier oscillation recovery scheme. The study considers the existing methods for eliminating the phase ambiguity of the recovered carrier frequency in typical QPSK modems, and identifies the shortcoming of a low-speed response oscillation recovery circuit. The authors propose a QPSK demodulator circuit with a fast adjustment of the reference oscillator, which is due to the fact that no loop filter is used in the feedback and that a digital calculator of the required phase shift is used. An algorithm for the frame synchronization restoration with the simultaneous elimination of the phase ambiguity multiple of 90° was also developed using synthesized binary sequences with an ideal non-periodic autocorrelation function (NACF) at even shifts that do not have the rotary symmetry property. The phase ambiguity elimination algorithm proposed in the article can be used as an alternative to standard modems with differential coding.

Download Full-text

Fractional-N PLL with 90° phase shift lock and active switched-capacitor loop filter

Proceedings of the IEEE 2005 Custom Integrated Circuits Conference, 2005. ◽

10.1109/cicc.2005.1568672 ◽

2006 ◽

Cited By ~ 2

Author(s):

J. Park ◽

F. Maloberti

Keyword(s):

Phase Shift ◽

Switched Capacitor ◽

Loop Filter

Download Full-text

Object Wave Determination by Single-Sideband Methods

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100071776 ◽

1973 ◽

Vol 31 ◽

pp. 266-267

Author(s):

Kenneth H. Downing ◽

Benjamin M. Siegel

Keyword(s):

Phase Shift ◽

Carbon Films ◽

Object Wave ◽

Electron Wave ◽

Phase Object ◽

Heavy Atoms ◽

Single Sideband ◽

Thin Carbon ◽

Additional Phase Shift ◽

Additional Phase

Under the “weak phase object” approximation, the component of the electron wave scattered by an object is phase shifted by π/2 with respect to the unscattered component. This phase shift has been confirmed for thin carbon films by many experiments dealing with image contrast and the contrast transfer theory. There is also an additional phase shift which is a function of the atomic number of the scattering atom. This shift is negligible for light atoms such as carbon, but becomes significant for heavy atoms as used for stains for biological specimens. The light elements are imaged as phase objects, while those atoms scattering with a larger phase shift may be imaged as amplitude objects. There is a great deal of interest in determining the complete object wave, i.e., both the phase and amplitude components of the electron wave leaving the object.

Download Full-text

A Many-Beam Technique for Enhanced Resolution of Partial Dislocations

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100096485 ◽

1972 ◽

Vol 30 ◽

pp. 646-647

Author(s):

J. M. Oblak ◽

B. H. Kear

Keyword(s):

Phase Shift ◽

Field Method ◽

Dark Field ◽

Bright Field ◽

Field Technique ◽

Weak Beam ◽

Partial Dislocations ◽

Enhanced Resolution ◽

Nickel Base ◽

Beam Technique

The “weak-beam” and systematic many-beam techniques are the currently available methods for resolution of closely spaced dislocations or other inhomogeneities imaged through strain contrast. The former is a dark field technique and image intensities are usually very weak. The latter is a bright field technique, but generally use of a high voltage instrument is required. In what follows a bright field method for obtaining enhanced resolution of partial dislocations at 100 KV accelerating potential will be described.A brief discussion of an application will first be given. A study of intermediate temperature creep processes in commercial nickel-base alloys strengthened by the Ll2 Ni3 Al γ precipitate has suggested that partial dislocations such as those labelled 1 and 2 in Fig. 1(a) are in reality composed of two closely spaced a/6 <112> Shockley partials. Stacking fault contrast, when present, tends to obscure resolution of the partials; thus, conditions for resolution must be chosen such that the phase shift at the fault is 0 or a multiple of 2π.

Download Full-text

Observation of surface morphology by reflection electron holography

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100154652 ◽

1989 ◽

Vol 47 ◽

pp. 536-537

Author(s):

N. Osakabe ◽

J. Endo ◽

T. Matsuda ◽

A. Tonomura

Keyword(s):

Phase Shift ◽

Surface Morphology ◽

High Sensitivity ◽

High Energy ◽

Path Difference ◽

Transmission Mode ◽

Electron Holography ◽

Dynamical Process ◽

High Vertical Resolution ◽

Amplification Technique

Progress in microscopy such as STM and TEM-TED has revealed surface structures in atomic dimension. REM has been used for the observation of surface dynamical process and surface morphology. Recently developed reflection electron holography, which employes REM optics to measure the phase shift of reflected electron, has been proved to be effective for the observation of surface morphology in high vertical resolution ≃ 0.01 Å.The key to the high sensitivity of the method is best shown by comparing the phase shift generation by surface topography with that in transmission mode. Difference in refractive index between vacuum and material Vo/2E≃10-4 owes the phase shift in transmission mode as shownn Fig. 1( a). While geometrical path difference is created in reflection mode( Fig. 1(b) ), which is measured interferometrically using high energy electron beam of wavelength ≃0.01 Å. Together with the phase amplification technique , the vertivcal resolution is expected to be ≤0.01 Å in an ideal case.

Download Full-text